Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method

ABSTRACT

In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device moves on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy, even if a member (for example, a surface plate and the like) that has a guide surface large enough to cover the total movement range of the weight cancellation device is not provided.

CROSS-REFERENCE TO RELATED APPLICATIONS

This non-provisional application claims the benefit of ProvisionalApplication No. 61/380,394 filed Sep. 7, 2010 and ProvisionalApplication No. 61/380,397 filed Sep. 7, 2010, the disclosures of whichare hereby incorporated herein by reference in their entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to exposure apparatuses, movable bodyapparatuses, flat-panel display manufacturing methods, and devicemanufacturing methods, and more particularly, to an exposure apparatusused in a lithography process when semiconductor devices, liquid crystaldisplay devices and the like are produced, a movable body apparatus thatis suitable as a device which moves holding an object subject toexposure of the exposure apparatus, a flat-panel display manufacturingmethod which uses the exposure apparatus, and a device manufacturingmethod which uses the exposure apparatus.

2. Description of the Background Art

Conventionally, in a lithography process for manufacturing electrondevices (microdevices) such as liquid crystal display devices andsemiconductor devices (such as integrated circuits), apparatuses areused such as an exposure apparatus based on a step-and-scan method (aso-called scanning stepper (also referred to as a scanner)) which whilesynchronously moving a mask or a reticle (hereinafter generally referredto as a “mask”) and a glass plate or a wafer (hereinafter generallyreferred to as a “substrate”) in a predetermined scanning direction,transfers a pattern formed on a mask onto a substrate using an energybeam.

In this type of exposure apparatus, an apparatus is known that has astacking type (gantry type) stage device which has a Y coarse movementstage movable in the cross-scan direction (a direction orthogonal to thescanning direction) installed on an X coarse movement stage movable inlong strokes in the scanning direction, and as the stage device, forexample, a stage device is known that has a configuration in which aweight cancelling device moves along a horizontal surface on a surfaceplate formed of a stone material (e.g., refer to U.S. Patent ApplicationPublication No. 2010/0018950).

However, with the exposure apparatus according to U.S. PatentApplication Publication No. 2010/0018950 described above, because theweight cancelling device moves within a wide range corresponding to thestep-and-scan movement, the degree of flatness of the upper surface(movement guide plane of the weight cancelling device) of the surfaceplate has to be finished highly in a wide range. However, in recentyears, substrates subject to exposure of exposure apparatuses tend toincrease in size, and with it, the size of surface plates tend toincrease, which may decrease transportability of the exposure apparatus,workability at the time of assembly and the like, in addition to anincrease in cost.

However, in the exposure apparatus according to U.S. Patent ApplicationPublication No. 2010/0018950 described above, a wide space was necessaryin the height direction in order to put actuators and the like to finelydrive the XY two-axis stage and the fine movement stage in between thesurface plate (stage base) and the fine movement stage. Therefore, theweight cancellation device had to be large (tall), and a large driveforce was necessary to drive the weight cancellation device along thehorizontal plane.

Conventionally, when driving a large mass substrate stage, a coredlinear motor which generates a large drive force (thrust) was employed.In this cored linear motor, a magnetic attractive force (attraction)which is several times the thrust is generated between a magnet unitincluded in a mover (or a stator) and a coil unit that has a core (aniron core) included in a stator (or a mover). Specifically, a suctionforce of 10000 to 20000N is generated with respect to a thrust of 4000N.

Accordingly, in the case of a conventional substrate stage devicestructured in the manner described above, a large weight load (and aninertia force which occurs with the movement of an X coarse movementstage) such as of a substrate, a Y coarse movement stage, the X coarsemovement stage and, the like acts on a pair of single axis drive unitsplaced between X coarse movement stage and a stage base, as well as alarge attraction generated especially from the cored linear motorconfiguring the pair of single axis drive units described above.Therefore, the single axis drive unit, especially the linear motor and aguide device that configure a part of the single axis drive unit need tohave a large load capacity (capacity) and a movable member and a fixedmember also have to be configured strongly to be able to stand theattraction from the linear motor.

Meanwhile, because a large frictional resistance acts between a linearguide (rail) and a slider that configure a guide device (a single axisguide), which increases drive resistance, a linear motor which generatesa larger drive force will be needed. Further, additional problems suchas an increase in size of the substrate stage device, generation offrictional heat in the guide device and generation of Joule's heat inthe linear motor, mechanical damage by adsorbates will become evident.

SUMMARY OF THE INVENTION

According to a first aspect of the present invention, there is provideda first exposure apparatus of a scanning type which moves an objectsubject to exposure in a first direction parallel to a horizontal planewith a predetermined first stroke with respect to an energy beam forexposure at the time of exposure processing, the apparatus comprising: afirst movable body which is movable by the predetermined first stroke atleast in the first direction; a second movable body which guidesmovement of the first movable body in the first direction and is movableby a second stroke along with the first movable body in a seconddirection orthogonal to the first direction within the horizontal plane;an object holding member which holds the object and is movable in adirection at least parallel to the horizontal plane with the firstmovable body; a weight cancellation device which supports the objectholding member from below and cancels weight of the object holdingmember; and a support member which extends in the first direction, andsupports the weight cancellation device from below, and also is movablein the second direction by the second stroke in a state supporting theweight cancellation device from below.

According to this apparatus, at the time of exposure processing to anobject, an object holding member holding the object with the firstmovable body is driven in a direction parallel to the first direction(scanning direction). Further, the object moves in the second direction,by the second movable body being driven in the second directionorthogonal to the first direction. Accordingly, the object can be movedtwo-dimensionally along a plane parallel to a horizontal plane. Now, inorder to move the object in the first direction, only the first movablebody (and the object holding member) has to be driven, therefore, massof the movable body (only the first movable body, the object holdingmember, and the weight cancellation device) which is driven at the timeof scanning exposure is small when compared to the case when anothermovable body that moves in the second direction is mounted on themovable body that moves in the first direction. Accordingly, the size ofactuators used to move an object can be reduced. Further, because thesupport member supporting the weight cancellation device from belowconsists of a member extending in the first direction, and is alsomovable in the second direction in a state supporting the weightcancellation device from below, the weight cancellation devices isconstantly supported from below by the support member, regardless of itsposition within the horizontal plane. Accordingly, the weight and sizeof the entire device can be reduced when compared to the case when alarge member having a guide surface large enough to cover the movementrange of the weight cancellation device is provided.

According to a second aspect of the present invention, there is provideda movable body apparatus, comprising: a movable body which moves atleast in a first direction parallel to a first axis within a planeparallel to a horizontal plane; a base which supports the movable body;and a drive device which includes a first mover and a second moverprovided in the movable body in a first predetermined direction and asecond predetermined direction intersecting the first predetermineddirection, and a first stator and a second stator facing the first moverand the second mover on the base each provided extending in the firstdirection, and drives the movable body in the first direction withrespect to the base using a drive force in the first direction that isgenerated between the first mover and the first stator, and the secondmover and the second stator, respectively, wherein at least one of thefirst predetermined direction and the second predetermined direction isa direction intersecting a second axis orthogonal to the first axiswithin the horizontal plane and a third axis orthogonal to thehorizontal plane, and at least at the time when the movable body isdriven in the first direction, forces in the first predetermineddirection and the second predetermined direction act between the firstmover and the first stator, and the second mover and the second stator,respectively.

In this case, the force in the first predetermined direction (opposingdirection) acting between the first mover and the first stator, and theforce in the second predetermined direction (opposing direction) actingbetween the second mover and the second stator, is either the suctionforce or a repulsive force in the opposing direction, and for example, amagnetic force can be representatively given, however, the force is notlimited to this, and can also be a vacuum suction force, pressure by thestatic pressure of a gas and the like.

According to this apparatus, the load including the self-weight of themovable body applied to the base is reduced utilizing the force in thefirst predetermined direction acting between the first mover and thefirst stator and the force in the second predetermined direction actingbetween the second mover and the second stator at the time when themovable body is driven in the first direction, and the movable body canbe driven with high precision without hindering drive performance.

According to a third aspect of the present invention, there is provideda second exposure apparatus that irradiates an energy beam and forms apattern on an object, the apparatus comprising: the movable bodyapparatus of the present invention in which the object is held on theanother movable body.

According to this apparatus, because the movable body holding the objectcan be driven with high accuracy, this allows an exposure with highprecision to the object.

According to a fourth aspect of the present invention, there is provideda third exposure apparatus, the apparatus comprising: a movable bodywhich holds an object and moves at least in a first direction parallelto a first axis within a plane parallel to a horizontal plane; a basewhich supports the movable body; a drive device which includes a firstmover and a second mover provided in the movable body in a firstpredetermined direction and a second predetermined directionintersecting the first predetermined direction, and a first stator and asecond stator facing the first mover and the second mover on the baseprovided extending in the first direction, and drives the movable bodyin the first direction with respect to the base, and on the drive,utilizes a force in the first predetermined direction and a force in thesecond predetermined direction acting between the first mover and thefirst stator, and the second mover and the second stator, respectively,as a levitation force of the movable body; and a pattern generationdevice which irradiates an energy beam on the object and generates apattern on the object.

According to this apparatus, because the drive device utilizes the forcein the first predetermined direction acting between the first mover andthe first stator and the force in the second predetermined directionacting between the second mover and the second stator at the time whenthe movable body is driven as a levitation force of the movable body,the load including the self-weight of the movable body applied to thebase is reduced, and the movable body can be driven with high precisionwithout hindering drive performance.

According to a fifth aspect of the present invention, there is provideda flat-panel display manufacturing method, comprising: exposing thesubstrate using one of the first to third exposure apparatuses of thepresent invention; and developing the substrate that has been exposed.

According to a sixth aspect of the present invention, there is provideda device manufacturing method, including exposing the object using oneof the first to third exposure apparatuses of the present invention; anddeveloping the object that has been exposed.

BRIEF DESCRIPTION OF THE DRAWINGS

In the accompanying drawings;

FIG. 1 is a view that schematically shows a configuration of an exposureapparatus related to a first embodiment;

FIG. 2 is a planar view of a substrate stage which the exposureapparatus in FIG. 1 has;

FIG. 3A is a side view (a sectional view of line A-A in FIG. 2) of thesubstrate stage in FIG. 2 when viewed from the −Y direction, FIG. 3B isan enlarged view of the periphery of the weight cancellation device thatthe substrate stage has, and FIG. 3C is an enlarged view of theperiphery of the base frame (the −X side);

FIG. 4 is a planar view of the substrate stage except for the finemovement stage FIG. 3A (a sectional view of line B-B in FIG. 3);

FIG. 5 is a sectional view of line C-C in FIG. 2;

FIG. 6 is a perspective view of the substrate stage in FIG. 2 which ispartially omitted;

FIG. 7 is a block diagram that shows an input/output relation of a maincontroller, which centrally configures a control system of an exposureapparatus related to a first embodiment;

FIG. 8 is a view that schematically shows a configuration of an exposureapparatus related to a second embodiment;

FIG. 9 is a planar view of a substrate stage which the exposureapparatus in FIG. 8 has;

FIG. 10 is a sectional view of line D-D in FIG. 9;

FIG. 11 is a planar view of the substrate stage except for the finemovement stage (a sectional view of line E-E in FIG. 10);

FIG. 12 is a sectional view of line F-F in FIG. 9;

FIG. 13 is a sectional view of the weight cancellation device which thesubstrate stage device in FIG. 9 has;

FIG. 14 is a planar view of a substrate stage related to a thirdembodiment;

FIG. 15 is a sectional view of line G-G in FIG. 14;

FIG. 16 is a sectional view of the weight cancellation device which thesubstrate stage device in FIG. 14 has;

FIG. 17 is a planar view of a substrate stage related to a fourthembodiment;

FIG. 18 is a sectional view of a weight cancellation device and aleveling device that the substrate stage device related to a firstmodified example has;

FIG. 19 is a sectional view of a weight cancellation device and aleveling device that the substrate stage device related to a secondmodified example has;

FIG. 20 is a sectional view of a weight cancellation device and aleveling device that the substrate stage device related to a thirdmodified example has;

FIG. 21A shows a modified example of an X guide, FIGS. 21B and 21C showa substrate stage device related to other modifications;

FIG. 22 is a view that shows other modified examples of the substratestage;

FIG. 23 is a side view showing a schematic configuration of a stagedevice equipped in an exposure apparatus related to the fifthembodiment;

FIG. 24 is a sectional view of line H-H in FIG. 23;

FIG. 25 is a block diagram used to explain an input/output relation of amain controller equipped in the exposure apparatus of the fifthembodiment;

FIG. 26 is a sectional view showing a schematic configuration of asingle axis drive unit which configures a stage drive system;

FIG. 27 is a view used to explain a balance of forces acting on eachpart of the single axis drive unit;

FIG. 28 is a view used to explain an assembling method of the singleaxis drive unit;

FIG. 29 is a view showing a modified example (No. 1) of the single axisdrive unit; and

FIG. 30 is a view showing a modified example (No. 2) of the single axisdrive unit.

DESCRIPTION OF THE EMBODIMENTS First Embodiment

A first embodiment will be described below, with reference to FIGS. 1 to7.

FIG. 1 schematically shows a configuration of an exposure apparatus 10related to the first embodiment. Exposure apparatus 10 is a projectionexposure apparatus by a step-and-scan method, or a so-called scanner inwhich a rectangular glass substrate P (hereinafter, simply referred toas a substrate F) that is used in a liquid crystal display device (flatpanel display) serves as an exposure subject.

As shown in FIG. 1, exposure apparatus 10 is equipped with anillumination system IOP, a mask stage MST holding a mask M, a projectionoptical system PL, a pair of substrate stage mountings 19, a substratestage PST holding a substrate P movable along a horizontal plane, and acontrol system and the like thereof. In the description below, theexplanation is given assuming that a direction within a horizontal planein which mask M and substrate P are scanned relative to projectionoptical system PL, respectively, during exposure is an X-axis direction,a direction orthogonal to the X-axis direction within a horizontal planeis a Y-axis direction, and a (direction orthogonal to the X-axis andY-axis directions is a Z-axis direction, and rotational (tilt)directions around the X-axis, Y-axis and Z-axis are θx, θy and θzdirections, respectively.

Illumination system IOP is configured similar to the illumination systemthat is disclosed in, for example, U.S. Pat. No. 6,552,775 and the like.

More specifically, illumination system IOP has a plurality of, e.g.,five, illumination systems which illuminate a plurality of, e.g., five,illumination areas that are placed in a zigzag shape on mask M,irradiates mask M with a light emitted from a light source that is notillustrated (e.g. a mercury lamp), as an illumination light for exposure(illumination light) IL, via a reflection mirror, a dichroic mirror, ashutter, a wavelength selecting filter, various types of lenses and thelike, which are not illustrated. As illumination light IL, for example,a light such as an i-line (with a wavelength of 365 nm), a g-line (witha wavelength of 436 nm) or an h-line (with a wavelength of 405 nm) (or asynthetic light of the i-line, the g-line and the h-line describedabove) is used. Further, the wavelength of illumination light IL can beappropriately switched by the wavelength selecting filter, for example,according to the required resolution.

On mask stage MST, mask M having a pattern surface (the lower surface inFIG. 1) on which a circuit pattern and the like are formed is fixed by,for example, vacuum suction. Mask stage MST is mounted on a guide memberwhich is not illustrated in a non-contact state, and is driven, forexample, in predetermined strokes in a scanning direction (the X-axisdirection) by a mask stage drive system MSD (not illustrated in FIG. 1,refer to FIG. 7) including a linear motor, as well as being finelydriven appropriately in the Y-axis direction and the θz direction.

Positional information of mask stage MST within the XY plane isconstantly measured by a laser interferometer (hereinafter referred toas a “mask interferometer”) 16, which projects a laser beam (measurementbeam) on a reflection surface arranged (or formed) on mask M, at aresolution of, for example, around 0.5 to 1 nm. The measurement resultsare supplied to main controller 50 (refer to FIG. 7).

Main controller 50 drives and controls mask stage MST via mask stagedrive system MSD (not illustrated in FIG. 1, refer to FIG. 4), based onthe measurement results obtained by mask interferometer 16.Incidentally, instead of mask interferometer 16, or along with maskinterferometer 16, an encoder (or an encoder system which is configuredof a plurality of encoders) can be used.

Projection optical system PL is placed below mask stage MST in FIG. 1.Projection optical system PL has a configuration similar to theprojection optical system disclosed in, for example, U.S. Pat. No.6,552,775. More specifically, projection optical system PL includes aplurality of, e.g., five, projection optical systems (multi-lensprojection optical systems) whose projection areas of a pattern image ofmask M are placed in a zigzag shape that corresponding to the pluralityof illumination areas, and functions equivalently to a projectionoptical system that has a single image field with a rectangular shapewhose longitudinal direction is in the Y-axis direction. In theembodiment, as each of the plurality of projection optical systems, forexample, a both-side telecentric equal-magnification system that formsan erected normal image is used, configured of a two-stage inmirror lensoptical system which is equipped with two sets each of a prism placedalong an optic axis, a group of optical elements (a lens group), and areflection mirror.

Therefore, when an illumination area on mask M is illuminated withillumination light IL from illumination system IOP, by illuminationlight IL that has passed through mask M whose pattern surface is placedsubstantially coincident with the first plane (object plane) ofprojection optical system PL, a projected image (partial erected image)of a circuit pattern of mask M within the illumination area is formed onan irradiation area (exposure area) of illumination light IL, which isconjugate to the illumination area, on substrate P which is placed onthe second plane (image plane) side of projection optical system PL andwhose surface is coated with a resist (sensitive agent), via projectionoptical system PL. Then, by moving mask M relative to the illuminationarea (illumination light IL) in the scanning direction (X-axisdirection) and also moving substrate P relative to an exposure area(illumination light IL) in the scanning direction (X-axis direction) bya synchronous drive of mask stage MST and a fine movement stage 21 whoseconfiguration will be described later on that configures a part ofsubstrate stage PST, scanning exposure of one shot area (divided area)on substrate P is performed, and a pattern of mask M (mask pattern) istransferred onto the shot area. More specifically, in the embodiment, apattern of mask M is generated on substrate P by illumination system IOPand projection optical system PL, and the pattern is formed on substrateP by exposure of a sensitive layer (resist layer) on substrate P withillumination light IL.

The pair of substrate stage mountings 19 each consist of a member whichextends in the Y-axis direction (refer to FIG. 5), and are supportedfrom below by vibration isolators 13 placed on floor (floor surface) Fon both ends in the longitudinal direction. The pair of substrate stagemountings 19 are placed at a predetermined distance parallel to theX-axis direction. The pair of substrate stage mountings 19 configure themain section (body) of exposure apparatus 10, and projection opticalsystem PL, mask stage MST and the like are installed in the mainsection.

Substrate stage PST, as shown in FIG. 1, is equipped with a pair of beds12, a pair of base frames 14, a coarse movement stage 23, a finemovement stage 21, a weight cancellation device 40, an X guide 102 whichsupports weight cancellation device 40 from below and the like.

The pair of beds 12 each consist of a rectangular box shaped member (arectangular parallelepiped member) whose longitudinal direction is inthe Y-axis direction in a planar view (when viewed from the +Z side).The pair of beds 12 are placed at a predetermined distance parallel tothe X-axis direction. As shown in FIG. 1, bed 12 on the +X side ismounted on substrate stage mounting 19 on the +X side, and bed 12 on the−X side is mounted on substrate stage mounting 19 on the −X side. Theposition (hereinafter referred to as a Z position) in the Z-axisdirection of the upper surface of the pair of beds 12, respectively, isadjusted to be substantially the same.

The vicinity of both ends in the longitudinal direction of the pair ofbeds 12 are mechanically connected by two interlinking members 79, as itcan be seen from FIGS. 1 and 2. As shown in FIG. 3A, the pair of beds 12each consist a member which is hollow, and in between the upper surfacesection and the lower surface section of bed 12, a rib that consists ofa plate shaped member parallel to the YZ plane is provided in plurals inthe X-axis direction at a predetermined distance, so as to securerigidity and strength. Further, although it is not illustrated, inbetween the upper surface section and the lower surface section of bed12, a rib that consists of a plate shaped member parallel to the XZplane is provided in plurals also in the Y-axis direction at apredetermined distance. In the center of each of the plurality of ribsand the side surface of bed 12, a circular hole is formed (refer to FIG.5) for reducing weight and molding. Incidentally, in the case, forexample, when a sufficient exposure accuracy can be secured withoutinterlinking member 79 being provided, interlinking member 79 does nothave to be provided.

On each upper surface of the pair of beds 12, as shown in FIG. 2, aplurality of Y linear guides 71A (e.g. four per one bed in theembodiment) which are elements of a mechanical single axis guide arefixed parallel to each other at a predetermined distance in the X-axisdirection.

As shown in FIGS. 1 and 3A, of the pair of base frames 14, one frame isplaced at the +X side of bed 12 which is at the +X side, and the otheris placed at the −X side of bed. 12 which is at the −X side. Since thepair of base frames 14 have the same structure, base frame 14 at the −Xside will be described below. As shown in FIG. 3C, base frame 14includes a main section 14 a consisting of a plate shape member havingone surface and the other surface parallel to the YZ plane and extendingin the Y axis direction, and a plurality of leg sections 14 b (notillustrated in FIGS. 2 and 4) that support main section 14 a from below.The length of main section 14 a (dimension in the longitudinal direction(the Y-axis direction)) is set longer than the length of each of thepair of beds 12 in the Y-axis direction. As leg sections 14 b, forexample, three leg sections are provided, in the Y-axis direction at apredetermined distance. At the lower end section of leg sections 14 b, aplurality of adjusters 14 c are installed so that the Z position of mainsection 14 a can be adjusted.

On both of the side surfaces of main section 14 a, a Y stator 73 whichis an element of the linear motor is fixed, respectively. Y stator 73has a magnet unit including a plurality of permanent magnets arranged ata predetermined distance in the Y-axis direction. Further, to the uppersurface and both of the side surfaces (the Lower part of Y stator 73described above) of main section 14 a, a Y linear guide 74A, which is anelement of a mechanical single axis guide, is fixed, respectively.

Referring back to FIG. 1, coarse movement stage 23 includes a Y coarsemovement stage 23Y and an X coarse movement stage 23X, which is mountedon Y coarse movement stage 23Y. Coarse movement stage 23 is locatedabove (on the +Z side of) the pair of beds 12.

As shown in FIG. 2, Y coarse movement stage 23Y has a pair of X beams101. The pair of X beams 101 are each made from a member extending inthe X-axis direction whose YZ section is a rectangular shape, and areplaced parallel to each other at a predetermined distance in the Y-axisdirection. Incidentally, the shape in the YZ section of each X beam 101,for example, can be an I shape because rigidity in the Y-axis directionis not required in comparison with the rigidity in the Z-axis direction(direction of gravitational force).

To the lower surface of each of the pair of X beams 101 in the vicinityof both ends in the longitudinal direction. As shown in FIG. 6, a memberreferred to as a Y carriage 75 is fixed, via a plate 76. That is to say,to the lower surface of Y coarse movement stage 23Y, for example, atotal of four Y carriages 75 are attached. Plate 76 consists of a plateshaped member extending in the Y-axis direction that is parallel to theXY plane, and mechanically connects the pair of X beams 101 to eachother. Since, for example, the total of four Y carriages 75 each havethe same structure, in the description below, one Y carriage 75corresponding to base frame 14 on the −X side will be described.

Y carriage 75, as shown in FIG. 3C, consists of a member whose XZsection is an inverted U-shape, and main section 14 a of base frame 14is inserted in between the pair of opposing surfaces. To each of thepair of opposing surfaces of Y carriage 72, each of a pair of Y movers72 are fixed facing each of a pair of Y stators 73 via a predeterminedclearance (space/gap), Y mover 72 includes a coil unit which is notillustrated, and configures a Y linear motor YDM (refer to FIG. 7) thatdrives Y coarse movement stage 23Y (refer to FIG. 1) in predeterminedstrokes along with Y stator 73 in the Y-axis direction. In thisembodiment, for example, since a total of four Y carriages 75 areprovided as described above, Y coarse movement stage 23Y is driven inthe Y-axis direction by a total of eight Y linear motors YDM.

To each of the pair of opposing surfaces and the ceiling surface of Ycarriage 75, a slider 74B is fixed which includes a rolling body (e.g.,a plurality of balls) and slidably engages with Y linear guide 74A.Incidentally, to each of the pair of opposing surfaces and the ceilingsurface of Y carriage 75, for example, two each of sliders 74B areattached (refer to FIG. 5) at a predetermined distance in a direction inthe depth of the page surface (the Y-axis direction), although thesliders beneath are hidden in the direction in the depth of the pagesurface in FIG. 3C, Y coarse movement stage 23Y (refer to FIG. 1) isguided advancing straight in the Y-axis direction by a plurality of Ylinear guide devices that include linear guides 74A and sliders 74B.Incidentally, although it is not illustrated, a Y scale whose periodicdirection is in the Y-axis direction is fixed to main section 14 a ofbase frame 14, and an encoder head configuring a Y linear encoder systemEY (refer to FIG. 7) that obtains positional information in the Y-axisdirection of Y coarse movement stage 23Y along with the Y scale is fixedto Y carriage 75. The position in the Y-axis direction of Y coarsemovement stage 23Y is controlled by a main controller 50 (refer to FIG.7), based on the output of the encoder head described above.

Now, as shown in FIG. 1, an auxiliary guide frame 103 is placed inbetween the pair of beds 12. Auxiliary guide frame 103 consists of amember extending in the Y-axis direction, and is installed on floor(floor surface) F via a plurality of adjusters. On the upper end surface(the end surface on the +Z side) of auxiliary guide frame 103, a Ylinear guide 77A, which is an element of a mechanical single axis guideextending in the Y-axis direction, is fixed. The Z position of the upperend of auxiliary guide frame 103 is set substantially the same as theupper surface of the pair of beds 12. Further, auxiliary guide frame 103is vibrationally separated from the pair of beds 12, and the pair ofsubstrate stage mountings 19, respectively. Incidentally, since the pairof beds 12 are mechanically connected by interlinking member 79, athrough hole which is not illustrated to pass through interlinkingmember 79 is formed in auxiliary guide frame 103.

To the lower surface of each of the pair of X beams 101 around thecenter in the longitudinal direction, auxiliary carriages 78 (refer toFIG. 6) are fixed. Auxiliary carriage 78 consists of a rectangularparallelepiped member, and as shown in FIG. 1, to the lower surface ofauxiliary carriage 78, a slider 77B is fixed which includes a rollingbody (e.g., a plurality of balls) and slidably engages with Y linearguide 77A. Incidentally, for one auxiliary carriage 78, for example, twoeach of sliders 77B are attached at a predetermined distance in adirection in the depth of the page surface (the Y-axis direction),although the sliders beneath are hidden in the direction in the depth ofthe page surface in FIG. 1. As described, Y coarse movement stage 23Y issupported from below around the center in the longitudinal direction byauxiliary guide frame 103 via auxiliary carriage 78, which restrains thebending caused by the self-weight.

Referring back to FIG. 2, on the upper surface of each of the pair of Xbeams 101, a plurality of (e.g., two per one X beam 101 in theembodiment) X linear guides 80A, which are elements of a mechanicalsingle axis guide extending in the X-axis direction, are fixed parallelto each other at a predetermined distance in the Y-axis direction.Further, on the upper surface of each of the pair of X beams 101 in thearea between the pair of x linear guides 80A, an X stator 81A is fixed.X stator 81A has a magnet unit including a plurality of permanentmagnets arranged at a predetermined distance in the X-axis direction.

As described above, Y coarse movement stage 23Y is supported from belowby the pair of base frames 14 and auxiliary guide frame 103, and isvibrationally separated from the pair of beds 12 and substrate stagemountings 19.

X coarse movement stage 23X is made of a plate shaped member having arectangular shape in a planar view, and as shown in FIG. 4, an openingis formed in the center portion. On the lower surface of X coarsemovement stage 23X, as shown in FIG. 5, a pair of X movers 81B that eachface X stator 81A are fixed to each of the pair of X beams 101 via apredetermined clearance (space/gap). Each of the X movers 81B includes acoil unit which is not illustrated, and configures an X linear motor DM(refer to FIG. 7) that drives X coarse movement stage 23X inpredetermined strokes along with X stator 81A described above in theX-axis direction. In the embodiment, X coarse movement stage 23X drivenin the X-axis direction, for example, by a pair of (two) X linear motorsXDM provided corresponding to the pair of beams 101.

Further, to the lower surface of X coarse movement stage 23X, as shownin FIG. 1, a plurality of sliders 80B are fixed which include a rollingbody (e.g., a plurality of balls) and slidably engage with X linearguides 80A. For example, four sliders 80B are provided at apredetermined distance in the X-axis direction for one X linear guide80A, and for example, a total of 16 sliders 80B are fixed to the lowersurface of X coarse movement stage 23X. X coarse movement stage 23 isguided advancing straight in the X-axis direction by a plurality of Xlinear guide devices that include each of the X linear guides 80A andsliders 80B. Further, relative movement of X coarse movement stage 23Xin the Y-axis direction with respect to Y coarse movement stage 23Y isrestricted by the plurality of sliders 80B, and X coarse movement stage23X moves in the Y-axis direction integrally with Y coarse movementstage 23Y.

Incidentally, although it is not illustrated, an X scale whose periodicdirection is in the X-axis direction is fixed to at least one of thepair of X beams 101, and an encoder head configuring an X linear encodersystem EX (refer to FIG. 7) to obtain positional information in theX-axis direction of X coarse movement stage 23X is fixed to X coarsemovement stage 23X. The position in the X-axis direction of X coarsemovement stage 23X is controlled by main controller 50 (refer to FIG.7), based on the output of the encoder head described above. In theembodiment, an encoder system 20 (refer to FIG. 7) which detectspositional information (including rotation in the θz direction) withinthe XY plane of the coarse movement stage (X coarse movement stage 23X)is configured including X linear encoder system EX described above and Ylinear encoder system EY previously described.

Further, although it is not illustrated, a stopper member whichmechanically sets the movable amount of fine movement stage 21 withrespect to X coarse movement stage 23X, or a gap sensor which measuresthe relative movement amount of fine movement stage 21 with respect to Xcoarse movement stage 23X in the X-axis and Y-axis directions and thelike are attached to X coarse movement stage 23X.

As it can be seen from FIGS. 1 and 2, fine movement stage 21 consists ofa plate shaped (or a box shaped (a hollow rectangular parallelepiped)member) which is substantially square in a planar view, and holdssubstrate P via a substrate holder PH on its upper surface byadsorption, such as, for example, by vacuum suction (or electrostaticadsorption).

Fine movement stage 21 is finely driven on X coarse movement stage 23Xin directions of three degrees of freedom (the X-axis, the Y-axis, andthe θz directions) by a fine movement stage drive system 26 (refer toFIG. 7) which includes a plurality of voice coil motors (or linearmotors) configured each including stators fixed to X coarse movementstage 23X and movers fixed to fine movement stage 21. As the pluralityof voice coil motors, as shown in FIG. 2, a pair of X voice coil motors18X which finely drive fine movement stage 21 in the X-axis directionare provided spaced apart in the Y-axis direction, and a pair of Y voicecoil motors 18Y which finely drive fine movement stage 21 in the Y-axisdirection are provided spaced apart in the X-axis direction. Finemovement stage 21 moves in predetermined strokes in the X-axis directionand/or the Y-axis direction along with X coarse movement stage 23X, bybeing synchronously driven (driven in the same direction at the samespeed with X coarse movement stage 23X) with X coarse movement stage 23Xusing X voice coil motor 18X and/or Y voice coil motor 18Y describedabove. Accordingly, fine movement stage 21 can be moved (coarsemovement) in long strokes in the X, Y, two axial directions with respectto projection optical system PL (refer to FIG. 1), and also can befinely moved (fine movement) in directions of three degrees of freedom,which are X, Y, and θz directions.

Further, as shown in FIG. 3B, fine movement stage drive system 26 has aplurality of Z voice coil motors 18Z so as to finely drive fine movementstage 21 in the directions of three degrees of freedom, in the θx, theθy and the Z-axis directions. The plurality of Z voice coil motors 18Zare disposed at places corresponding to the four corners on the bottomsurface of fine movement stage 21 (only two out of four Z voice coilmotors 18Z are illustrated in FIG. 3B, and the remaining two areomitted). The configuration of the fine movement stage drive systemincluding the plurality of voice coil motors is disclosed in, forexample, U.S. Patent Application Publication No. 2010/0018950.

In the embodiment, a substrate stage drive system PSD is configured(refer to FIG. 7) including fine movement stage drive system 26, and acoarse movement stage drive system consisting of the plurality of Ylinear motors YDM previously described and the pair of X linear motorsXDM.

To the side surface on −X side of fine movement stage 21, as shown inFIG. 3A, an X movable mirror (a bar mirror) 22X having a reflectionsurface which is orthogonal to the X-axis is fixed, via mirror base 24X.Further, to the side surface on the −Y side of fine movement stage 21 asshown in FIG. 5, a Y movable mirror 22Y having a reflection surfacewhich is orthogonal to the Y-axis is fixed, via a mirror base 24Y.Positional information in the XY plane of fine movement stage 21 isconstantly detected at a resolution of around 0.5-1 nm by a laserinterferometer system (hereinafter referred to as a substrateinterferometer system) 92 using X movable mirror 22X and Y movablemirror 22Y (refer to FIG. 1). Incidentally, while substrateinterferometer system 92 is actually equipped with a plurality of Xlaser interferometers and Y laser interferometers that correspond to Xmovable mirror 22X and Y movable mirror 22Y, respectively, only the Xlaser interferometer is representatively illustrated in FIG. 1. Theplurality of laser interferometers are each fixed to the main section ofthe device. Further, positional information of fine movement stage 21 inthe θx, θy and the Z-axis directions is obtained by a sensor which isnot illustrated fixed to the lower surface of fine movement stage 21,for example, using a target fixed to weight cancellation device 40 thatwill be described later on. The configuration of a position measuringsystem of fine movement stage 21 described above is disclosed in, forexample, U.S. Patent Application Publication No. 2010/0018950.

Weight cancellation device 40 consists of a columnar member extending inthe Z-axis direction as shown in FIG. 3A, and is also referred to as acentral column. Weight cancellation device 40 is mounted on an X guide102 which will be described later on, and supports fine movement stage21 from below via a leveling device 57 which will be described later onThe upper half of weight cancellation device 40 is inserted into theopening of X coarse movement stage 23X, and the lower half is insertedin between the pair of X beams 101 (refer to FIG. 4).

As shown in FIG. 3B, weight cancellation device 40 has a housing 41, anair spring 42 and a Z slider 43 and the like. Housing 41 consists of acylinder-like member that has a bottom and whose surface opens on the +Zside. To the lower surface of housing 41, a plurality of air bearings(hereinafter referred to as base pads) 44 whose bearing surfaces facethe −Z side are attached. Air spring 42 is housed inside housing 41. Toair spring 42, pressurized gas is supplied from the outside. Z slider 43consists of a cylindrical member extending in the Z-axis direction, andis inserted into housing 41 and mounted on air spring 42. To an edge onthe +Z side of Z slider 43, an air bearing which is not illustratedwhose bearing surface faces the +Z side is attached.

Leveling device 57 is a device which tiltably (swingable in the θx andθy directions with respect to the XY plane) supports fine movement stage21, and is supported from below in a noncontact manner by the airbearing described above attached to Z slider 43. Weight cancellationdevice 40 negates (cancels out) the weight (a force whose direction ofgravitational force is downward) of the system including fine movementstage 21 via Z slider 43 and leveling device 57 with a force whosedirection of gravitational force is upward generated by air spring 42,which reduces the load of the plurality of Z voice coil motors 18Zdescribed above.

Weight cancellation device 40 is mechanically connected to X coarsemovement stage 23X via a plurality of interlinking devices 45. The Zposition of the plurality of interlinking devices 45 approximatelycoincides with the position of the center of gravity in the Z-axisdirection of weight cancellation device 40. Interlinking device 45includes a thin steel plate parallel to the XY plane, and is alsoreferred to as a flexure device. Interlinking device 45 connects(interlinking devices 45 on the +Y side and the −Y side are notillustrated in FIG. 3B, refer to FIG. 4) housing 41 of weightcancellation device 40 and X coarse movement stage 23X on the +X side,the −X side, the +Y side, and the −Y side of weight cancellation device40. Accordingly, with X coarse movement stage 23X pulling weightcancellation device 40 via any of the plurality of interlinking devices45, weight cancellation device 40 moves in the X-axis direction or theY-axis direction integrally with X coarse movement stage 23X. In doingso, because a tractive force acts on weight cancellation device 40 in aplane parallel to the XY plane including the position of the center ofgravity in the Z-axis direction, moment (pitching moment) around theaxis orthogonal to the movement direction does not act. Incidentally,details on weight cancellation device 40 of the embodiment includingleveling device 57 and interlinking device 45 are disclosed in, forexample, U.S. Patent Application Publication No. 2010/0018950.

X guide 102, as shown in FIG. 3A, includes a guide main section 102 aconsisting of a member (refer to FIG. 5) whose YZ section is an invertedU-shape and longitudinal direction is in the X-axis direction, and aplurality of ribs 102 b. X guide 102 is placed above (the +Z side) ofthe pair of beds 12 described above, traversing the pair of beds 12. Thelength (dimension in the longitudinal direction (the X-axis direction))of X guide 102 is set somewhat longer than the sum of the X-axisdirection dimension of each of the pair of beds 12 placed at apredetermined distance in the X-axis direction and the X-axis directiondimension of the gap in between the pair of beds 12. Therefore, as shownin FIG. 2, the edge on the side of X guide 102 protrudes further to the+X side (outside of bed 12) than the edge on the +X side of bed 12 atthe +X side, and the edge on the −X side of X guide 102 protrudesfurther to the −X side (outside of bed 12) than the edge on the −X sideof bed 12 at the −X side.

The upper surface (the surface on the +Z side) of guide main section 102a is parallel to the XY plane, and its degree of flatness is extremelyhigh. On the upper surface of guide main section 102 a, weightcancellation device 40 is mounted in a non-contact state via a pluralityof base pads 44. The upper surface of guide main section 102 a isadjusted with good accuracy so that the surface is parallel to ahorizontal plane, and functions as a guide surface when weightcancellation device 40 moves. The length (dimension in the longitudinaldirection) of guide main section 102 a is set somewhat longer than themovable amount of weight cancellation device 40 (in other words, Xcoarse movement stage 23X) in the X-axis direction. The width (dimensionin the Y-axis direction) of guide main section 102 is set (refer to FIG.4) to a dimension so that guide main section 102 can face the bearingsurfaces of all of the plurality of base pads 44. Further, both ends inthe longitudinal direction of guide main section 102 a are blocked byplate shaped members that are parallel to the YZ plane.

The plurality of ribs 102 b each consist of a plate shape memberparallel to the YZ plane, and are provided spaced at a predetermineddistance in the X-axis direction. The plurality of ribs 102 b are eachconnected to a pair of opposing surfaces and a ceiling surface of guidemain section 102 a. In this case, while the material and manufacturingmethod of X guide 102 including the plurality of ribs 102 b are notlimited in particular, for example, in the case when X guide 102 isformed by casting using iron and the like, when X guide 102 is formed bya stone material (e.g., gabbro), or when X guide 102 is formed byceramics or a CFRP (Carbon Fiber Reinforced Plastics) material, guidemain section 102 a and the plurality of ribs 102 b are integrallyformed. However, guide main section 102 a and the plurality of ribs 102b can be separate members, and the plurality of ribs 102 b can beconnected to guide main section 102 a by welding. Incidentally, X guide102 can be configured of a solid member, or a box shape whose lowersurface side is closed.

To the lower end of each of the plurality of ribs 102 b, a Y slider 71Bincluding a rolling body (e.g., a plurality of balls) is fixed slidableto Y linear guide 71A fixed to the upper surface of each of the pair ofbeds 12 described above. Incidentally, as shown in FIG. 4, a pluralityof (in the embodiment, e.g., two per one Y linear guide 71A) Y sliders71B are fixed in the Y axis direction at a predetermined distance.Flatness adjustment of the upper surface of guide main section 102 ashould be performed by appropriately inserting a shim in between theplurality of ribs 102 b and Y sliders 71B.

As shown in FIG. 2, to the plate shaped members described aboveprovided, at both ends in the longitudinal direction of X guide 102, Ymovers 72A which are elements of Y linear motors 82 (refer to FIG. 7)that drive each of the X guides 102 in the Y-axis direction withpredetermined strokes are fixed (refer to FIG. 4. Incidentally, for thesake of clarity, plate 76 is not illustrated in FIG. 4.) facing each ofthe pair of Y stators 73 (refer to FIG. 3C) described above via apredetermined clearance (space/gap). Each Y mover 72A has a coil unitwhich is not illustrated. X guide 102 is driven in predetermined strokesin the Y-axis direction by the pair of Y linear motors 82 each includingY stator 73 and Y mover 72A. In other words, in the present embodiment,the pair of Y linear motors 82 which drives X guide 102 in the Y-axisdirection and Y linear motor YDM which drives Y coarse movement stage23Y in the Y-axis direction each use stator 73 in common.

Further, although it is not illustrated, to one of the pair of beds 12described above, a Y scale whose periodic direction is in the Y-axisdirection is fixed, and to X guide 102, an encoder head which configuresa Y linear encoder system 104 (refer to FIG. 7) that obtains positionalinformation in the Y-axis direction of X guide 102 along with the Yscale is fixed. X guide 102 and Y coarse movement stage 23Y aresynchronously driven (however, the Y position can be controlledindividually if necessary) in the Y-axis direction by main controller 50(refer to FIG. 7), based on the output of the encoder head describedabove based on the output of the encoder head described above.

Besides the description above, on the upper surface of substrate holderPH, a rectangle tabular shaped mark plate (not illustrated) whoselongitudinal direction is in the Y-axis direction is fixed. The heightof this mark plate is set so that its surface is substantially flushwith the surface of substrate P mounted on substrate holder PH. And, onthe surface of the mark plate, a plurality of, in this case, six,reference marks (not illustrated) are formed collaterally in the Y axisdirection.

Further, inside of substrate holder PH (fine movement stage 21) below(the −Z side) each of the six reference marks, six mark image detectionsystems MD_(1 to MD) ₆ (refer to FIG. 7) are placed including a lenssystem and an imaging device (such as a CCD). These mark image detectionsystems MD1 to MD6 simultaneously detect projected images of alignmentmarks on mask M made by each of five projection optical systems and thelens systems and images of reference marks (not illustrated) formed bythe lens system, and measures the position of the images of thealignment marks using the position of the images of the reference marksas a reference. The measurement results are supplied to main controller50, and are used on alignment (mask alignment) and the like of mask M.

Furthermore, in exposure apparatus 10, six alignment detection systemsAL1 to AL6 (refer to FIG. 7) of the off-axis method are provided todetect the six reference marks and the alignment marks on substrate P.The six alignment detection systems are placed sequentially along theY-axis, on the +X side of projection optical system PL.

As each alignment detection system, an image-processing type sensor ofthe FIA (Field Image Alignment) system is used. The FIA system sensor,for example, irradiates a broadband detection light that does notphotosensitize the resist on substrate P on a target mark, and capturesan image of an index (not illustrated) and an image of the target markformed on a light receiving surface by the light reflected from thetarget mark, using the imaging capturing device (CCD) and the like.Detection results of alignment detection systems to AL₆ are sent to maincontroller 50 via an alignment signal processing system (notillustrated).

Incidentally, other than the FIA system, an alignment sensor, whichirradiates a coherent detection light to a subject mark and detects ascattered light or a diffracted light generated from the subject mark ormakes two diffracted lights (e.g., the same order) generated from thesubject mark interfere and detects an interference light, can be usedalone or in combination as needed.

FIG. 7 shows a block diagram that shows input/output relations of maincontroller 50 that is configured of a control system of exposureapparatus 10 as the central component and performs overall control ofthe respective components. Main controller 50 includes a workstation (ora microcomputer) and the like, and has overall control over each part ofexposure apparatus 10.

Next, lot processing of substrate P in exposure apparatus 10 will bebriefly described.

When a lot subject to processing consisting of a plurality of (e.g., 50pieces or 100 pieces) substrates P is carried into a coater developer(hereinafter referred to as a “C/D”) (not illustrated) that is connectedin-line to exposure apparatus 10, the substrates in the lot is coatedsequentially with a resist, and is carried to exposure apparatus 10 by acarrier system (not illustrated). Further, under the control of maincontroller 50, mask M is loaded onto mask stage MST by a mask carrierdevice (mask loader) that is not illustrated, and then mask alignmentpreviously described is performed.

Then, when substrate F to which resist has been applied is loaded onsubstrate holder PH, main controller 50 uses alignment detection systemsAL₁ to AL₆ to detect the reference marks on substrate holder PH, andperforms base line measurement.

And then, main controller 50 detects a plurality of alignment markstransferred and formed along with a pattern on substrate P on exposureof the previous layer and the layers before, using alignment detectionsystems AL₁ to AL₆, and performs alignment of substrate P.

After the alignment of substrate P has been completed, main controller50 performs exposure operation by the step-and-scan method tosequentially transfer a pattern of mask M onto a plurality of shot areason substrate P by the scanning exposure previously described. Becausethis exposure operation is similar to the conventional exposureoperation by the step-and-scan method, the explanation thereabout shallbe omitted.

Now, in the exposure operation by the step-and-scan method describedabove, exposure processing is sequentially performed to a plurality ofshot areas provided on substrate P. Substrate P is driven at a constantspeed (hereinafter referred to as an X scan operation) in predeterminedstrokes in the X-axis direction at the time of a scan operation, and isappropriately driven in the X-axis direction and/or the Y-axis directionat the time of a step operation (hereinafter referred to as an X stepoperation and a Y step operation, respectively).

When substrate P is moved in the X-axis direction at the time of the Xscan operation and the X step operation, at substrate stage PST, Xcoarse movement stage 23X is driven in the X-axis direction on Y coarsemovement stage 23Y according to instructions based on measurement valuesof X linear encoder system EX from main controller 50, and fine movementstage 21 is synchronously driven with respect to X coarse movement stage23X by a plurality of X voice coil motors 18X according to instructionsbased on measurement values of substrate interferometer system 92 frommain controller 50. Further, when X coarse movement stage 23X moves inthe X-axis direction, X coarse movement stage 23X pulls weightcancellation device 40, moving weight cancellation device 40 in theX-axis direction along with X coarse movement stage 23X. In doing so,weight cancellation device 40 moves on X guide 102. Incidentally, at thetime of the X scan operation and the X step operation described above,while there may be a case when fine movement stage 21 is finely drivenin the Y-axis direction and/or the θz direction with respect to X coarsemovement stage 23X, because the Y position of weight cancellation device40 does not change, weight cancellation device 40 always moves only on Xguide 102.

To the contrary, at the time of the Y step operation, at substrate stagePST, Y coarse movement stage 23Y is driven in predetermined strokes inthe Y-axis direction on the pair of base frames 14 by the plurality of Ylinear motors YDM according to instructions based on measurement valuesof Y linear encoder system EY from main controller 50, and X coarsemovement stage 23X moves in predetermined strokes in the Y-axisdirection integrally with this Y coarse movement stage 23Y. Further,weight cancellation device 40 moves in predetermined strokes in theY-axis direction integrally with X coarse movement stage 23X. In doingso, X guide 102 which supports weight cancellation device 40 from belowis synchronously driven with Y coarse movement stage 23Y. Accordingly,weight cancellation device 40 is constantly supported from below by Xguide 102.

As described so far, according to exposure apparatus 10 of the presentembodiment, weight cancellation device 40 is constantly supported frombelow by X guide 102, regardless of its position in the XY plane.Because X guide 102 consists of a plate shaped member which has a narrowwidth and extends in the scanning direction, the weight of substratestage device PST can be reduced when compared with the case, forexample, when a guide member (a surface plate formed, for example, by astone material) that has a wide guide surface which covers the entiremovement range of weight cancellation device 40 is used. Further, whileprocessing and carriage of the guide member that has a wide guidesurface become difficult in the case the substrate becomes large,processing and carriage is easy for X guide 102 of the presentembodiment since X guide 102 consists of a plate shaped member of anarrow width that has a band shaped guide surface extending in theX-axis direction.

Further, because X guide 102 which is a member extending in the X-axisdirection is supported from below at a plurality of points by the pairof beds 12, this restrains the bending caused by the self-weight of Xguide 102 or the load of weight cancellation device 40. Further, sincetwo beds 12 are used, the size and the weight of each of the beds 12 canbe reduced when compared with the case when one bed 12 is used.Accordingly, processing and carriage, of bed 12 become easy, andworkability at the time of assembly of substrate stage device PST alsoimproves.

Further, because X guide 102 and the pair of beds 12 which guide X guide102 in the Y axis direction are to have a rib structure, X guide 102 andthe pair of beds 12 are light and the rigidity in the Z-axis directioncan also be easily secured. Accordingly, workability of the operation toassemble substrate stage device PST is better than in the case when aguide member having a wide guide surface is used.

Further, because weight cancellation device 40 is supported in anon-contact manner on X guide 102, vibration which occurs when movingweight cancellation device 40 does not travel to X guide 102.Accordingly, vibration does not travel, for example, to projectionoptical system PL via X guide 102, the pair of substrate stages 12,substrate stage mountings 19 and the like, which allows the exposureoperation to be performed with high precision. Further, because X guide102 is driven near the center of gravity in the Z-axis direction by thepair of Y linear motors 82 including Y stator 73 fixed to the pair ofbase frames 14, moment (pitching moment) around the X-axis is notgenerated, and the drive reaction force does not travel to substratestage mountings 19. Accordingly, the exposure operation can be performedwith high precision.

Further, because the movement in the Y-axis direction of X guide 102 isperformed at the time of the Y step operation described above wherepositioning accuracy with high precision is not necessary, even iffrictional resistance of the linear guide device or moment by the driveacts on weight cancellation device 40 or X guide 102, vibration which isgenerated due to the moment described above can be converged by the timeof the X scan operation after the Y step operation. Further, the yawingmovement (moment around the Z-axis) by the drive of X guide 102 in theY-direction can be strictly controlled and suppressed by the drive forcedifference of the pair of Y linear motors 82 used to drive X guide 102.

Furthermore, because coarse movement stage 23 (XY stage device) of thepresent embodiment is configured with X coarse stage 32X being mountedon Y coarse movement stage 23Y, inertial mass of X coarse stage 23Xwhich moves in long strokes in the X-axis direction serving as thescanning direction is smaller than the conventional XY stage device thathas a configuration, for example, in which the Y coarse stage is mountedon the X coarse stage. Accordingly, the drive reaction force that floor(floor surface) F receives via coarse movement stage 23 at the time ofthe X scan operation becomes smaller. As a result, at the time of the Xscan operation, floor vibration influencing the overall system can besuppressed. To the contrary, while the drive mass and the drive reactionforce when I coarse movement stage 23Y moves in the Y-axis directionbecome larger than the conventional XY stage device described above,because the movement is a Y step operation that does not requirepositioning accuracy with high precision, the exposure operation is lessaffected by the floor vibration.

Further, in coarse movement stage 23, the middle part in the X directionof each of the pair of X beams 101 that Y coarse movement stage 23Y hasis supported by auxiliary guide frame 103 placed in between the pair ofbeds 12, which restrains the bending caused by the self-weight or theload of X coarse movement stage 23X. Accordingly, straightness accuracyof X linear guides 80A fixed on the pair of X beams 101 can be improved,which allows X coarse movement stage 23X to be guided advancing straightin the X-axis direction with high precision. Further, each of the pairof X beams 101 does not require a firm structure (preferably a delicatemember) to secure the rigidity to bending when compared with the casewhen only both of the ends are supported.

Second Embodiment

Next, a second embodiment of the present invention will be described,with reference to FIGS. 8 to 13. Herein, the same or similar referencesigns are used for the components that are the same as or similar tothose in the first embodiment described previously, and the descriptionthereabout is simplified or omitted.

FIG. 8 schematically shows a configuration of an exposure apparatus 110related to the second embodiment. Exposure apparatus 110 is a projectionexposure apparatus by a step-and-scan method, or a so-called scanner inwhich a substrate P that is used in a liquid crystal display device(flat panel display) serves as an exposure subject.

FIG. 9 shows a planar view of a substrate stage device PSTa whichexposure apparatus 110 of FIG. 8 has, and FIG. 10 shows a sectional viewof line D-D in FIG. 9. Further, FIG. 11 shows a planar view (a sectionalview of line E-E in FIG. 10) of the substrate stage device except forthe fine movement stage, and FIG. 12 shows a sectional view of line F-Fin FIG. 9. Further, FIG. 13 shows a sectional view of the weightcancellation device which substrate stage device PSTa has.

As it can be seen when comparing FIGS. 8 to 13 and FIGS. 1 to 6 relatedto the first embodiment previously described, in exposure apparatus 110related to the second embodiment, the point where substrate stage devicePSTa is provided instead of substrate stage device PST differs fromexposure apparatus 10.

While the overall configuration of substrate stage device PSTa issimilar to substrate stage device PST, some points differ from substratestage device PST, such as weight cancellation device 40′ being providedinstead of weight cancellation device 40, a part of the configuration ofthe drive system of X guide 102 being different from substrate stagedevice PST and the like. The description below will focus mainly on thedifference.

In substrate stage device PSTa, as it can be seen from FIGS. 8 and 10, aposition (height position) in the Z-axis direction (vertical direction)of Y coarse movement stage 23Y and X guide 102 a position (a heightposition) partly overlaps each other.

To be concrete, in substrate stage device PSTa, as is shown in FIGS. 8and 10, to both side surfaces (not to the lower surface near both ends)in the longitudinal direction of each of the pair of X beams 101, Ycarriage 75 previously described is fixed. That is to say, Y coarsemovement stage 23Y has, for example, a total of four Y carriages 75.Further, the upper surface of two Y carriages 75 on the +X side ismechanically connected by a plate 76, and the upper surface of two Ycarriages 75 on the −X side is mechanically connected similarly by aplate 76. Incidentally, for the sake of clarity, plate 76 is notillustrated in FIG. 11.

Further, as weight cancellation device 40′, for example, as shown inFIG. 10, a type of device in which Z slider 43 and leveling device 57are integrally fixed is used. Weight cancellation device 40′ is mountedon X guide 102, and its lower half is inserted into the opening of Xcoarse movement stage 23X. Further, from the viewpoint of avoidingintricacy of the drawings, in FIGS. 8, and 10 to 12, weight cancellationdevice 40′, leveling device 57 which will be described later and thelike are typically shown (refer to FIG. 13 for a detailed configuration)

As shown in FIG. 13, weight cancellation device 40′ has a housing 41, anair spring 42, a Z slider 43 and the like. Housing 41 consists of acylinder-like member that has a bottom and whose surface opens on the +Zside. To the lower surface of housing 41, a plurality of base pads 44whose bearing surfaces face the −Z side are attached. To an outer wallsurface of housing 41, a plurality of arm members 47 are fixed tosupport a target 46 of a plurality of Z sensors 52 fixed to the lowersurface of fine movement stage 21. Air spring 42 is housed insidehousing 41. To air spring 42, pressurized gas is supplied from theoutside. Z slider 43 consists of a cylindrical member extending in theZ-axis direction whose height is lower (shorter) than the Z slider usedin the first embodiment previously described. Z slider 43 is insertedinto housing 41, and is mounted on air spring 42. Z slider 43 isconnected to an inner wall surface of housing 41 by a parallel platespring device 48 which includes a pair of flat springs parallel to theXY plane placed apart in the Z-axis direction. A plurality of (e.g.,three or four) parallel plate spring devices 48 are provided, forexample, around the outer periphery (the θz direction) of Z slider 43spaced approximately equally. Z slider 43 moves along the XY planeintegrally with housing 41 by rigidity (tensile rigidity) in a directionparallel to the horizontal surface of the plurality of plate springs. Onthe contrary, due to the flexibility (flexibleness) of the platesprings, Z slider 43 is finely movable in the Z-axis direction withrespect to housing 41. Because the pair of flat springs which parallelplate spring device 48 has are distanced apart in the Z-axis direction,slant (rotation in the θx or θy direction) of Z slider 43 is suppressed,and Z slider 43 is substantially movable only in the Z-axis directionwith fine strokes with respect to housing 41.

Leveling device 57 is a device which tiltably (swingable in the θx andθy directions with respect to the XY plane) supports fine movement stage21, and the upper half is inserted into fine movement stage 21 via anopening 21 a formed in the lower surface of fine movement stage 21.Weight cancellation device 40′ negates (cancels out) the weight (a forcewhose direction of gravitational force is downward) of the systemincluding fine movement stage 21 via Z slider 43 and leveling device 57with a force whose direction of gravitational force is upward generatedby air spring 42, which reduces the load of the plurality of Z voicecoil motors 18Z.

Leveling device 57 includes a leveling cup 49 consisting of a cup shapedmember whose surface on the +Z side opens, a polyhedron member 64 whichis to be inserted into the inner diameter side, and a plurality of airbearings 65 attached to the inner wall surface of leveling cup 49. Thelower surface of leveling cup 49 is integrally fixed to the uppersurface of Z slider 43 via a plate 68. Incidentally, to the ceilingsurface of fine movement stage 21, a plurality of omission preventingdevices 200 are attached to keep leveling cup 49 from dropping.Polyhedron member 64 consists of a triangular pyramid shaped member, andthe tip is inserted into leveling cup 49. The bottom surface (thesurface facing the +Z side) of polyhedron member 64 is fixed to theceiling surface of fine movement stage 21 via a spacer 51. For example,three air bearings 65 are provided in the inner wall surface of levelingcup 49 spaced approximately equally around θz. Leveling device 57supports fine movement stage 21 tiltable via an extremely smallclearance (space/gap) in a non-contact manner with the center of gravityCG serving as a center of rotation of a system including fine movementstage 21, by blowing out pressurized gas to the side surface ofpolyhedron member 64 from the plurality of air bearings 65.Incidentally, in FIG. 13, for the sake of clarity, for example, asectional view is shown (in other words, as for leveling device 57, FIG.13 is not a sectional view of a cross section parallel to the YZ plane)of two out of the three air bearings 65.

Now, when fine movement stage 21 moves in a direction parallel to the XYplane, polyhedron member 64 moves integrally with fine movement stage 21in the direction parallel to the XY plane. In doing so, air bearing 65is pushed by polyhedron member 64 by the rigidity (static pressure) of agaseous film formed between the bearing surface of air bearing 65 andpolyhedron member 64, which integrally makes fine movement stage 21 andleveling cup 49 move in the same direction as fine movement stage 21.And, because leveling cup 49 and z slider 43 are fixed via plate 68,fine movement stage 21 and Z slider 43 move integrally in a directionparallel to the horizontal plane. Further, because Z slider 43 andhousing 41 are connected by the plurality of parallel plate springdevices 48 as it has been described above, fine movement stage 21 andhousing 41 move in a direction parallel to the horizontal plane. Asdescribed above, fine movement stage 21 and weight cancellation device40′ constantly move integrally in the direction parallel to the XYplane, including the case when fine movement stage 21 and weightcancellation device 40′ are finely driven by the plurality of voice coilmotors 18X and 18Y. Therefore, in the second embodiment, interlinkingdevice 45 previously described is not provided between weightcancellation device 40′ and X coarse movement stage 23X.

Further, in the second embodiment, the size of guide main section 102 ain the Z-axis direction is set the same as the size of X beam 101 in theZ-axis direction. And, as can be seen from FIGS. 9, 10 and 12, guidemain section 102 a is inserted in between the pair of X beams 101. Inother words, the Z position (a position in the vertical direction) of Xguide 102 and the Z position of Y coarse movement stage 23Y partlyoverlap each other.

The configuration of other parts of substrate stage device PSTa issimilar to substrate stage device PST previously described.

In exposure apparatus 110 configured in the manner described above, whensubstrate P is moved in the X-axis direction at the time of the X scanoperation and the X step operation, at substrate stage PSTa, drive of Xcoarse movement stage 23X on Y coarse movement stage 23Y, andsynchronous drive of fine movement stage 21 with respect to X coarsemovement stage 23X are basically performed as in the first embodiment,according to instructions from main controller 50. However, in substratestage device PSTa, weight cancellation device 40′ is not pulled by Xcoarse movement stage 23X, and weight cancellation device 40′ moves inthe X-axis direction along with fine movement stage 21. Incidentally, atthe time of the X scan operation and the X step operation describedabove, while there may be a case when fine movement stage 21 is finelydriven in the Y-axis direction and the Y position of weight cancellationdevice 40′ changes minutely, the dimension of the width direction of Xguide 102 is set so that base pads 44 do not fall off from above X guide102 even if weight cancellation device 40′ is finely driven in theY-axis direction.

Further, in substrate stage device PSTa, at the time of Y stepoperation, drive of Y coarse movement stage 23Y and X coarse movementstage 23X in the Y-axis direction, and synchronous drive of finemovement stage 21 with respect to X coarse movement stage 23X arebasically performed as in the first embodiment, according toinstructions from main controller 50. However, in substrate stage devicePSTa, weight cancellation device 40′ moves in the Y-axis direction alongwith fine movement stage 21. In doing so, X guide 102 which supportsweight cancellation device 40′ from below is synchronously driven with Ycoarse movement stage 23Y. Accordingly, weight cancellation device 40′is constantly supported from below by X guide 102.

According to exposure apparatus 110 of the second embodiment describedso far, an equivalent effect can be obtained as in exposure apparatus 10related to the first embodiment previously described. In addition,according to exposure apparatus 110, because the Z position (a positionin the vertical direction) of X guide 102 and the Z position of Y coarsemovement stage 23Y partly overlap each other, the dimension in theZ-axis direction of weight cancellation device 40′ can be made shortedwhen compared with the case when weight cancellation device 40′ ismounted on a guide member that has a wide guide surface. In this case,because the dimension in the Z-axis direction of housing 41 and Z slider43 can be shortened, the weight of weight cancellation device 40′ can bereduced. Further, when the weight of weight cancellation device 40′ isreduced, the size of actuators (a plurality of linear motors and aplurality of voice coil motors) used to drive fine movement stage 21 canalso be reduced.

Further, because weight cancellation device 40′ is vibrationallyseparated from coarse movement stage 23, vibration travelling fromcoarse movement stage 23 can be totally eliminated, which improvescontrol performance. Further, by integrating weight cancellation device40′ and fine movement stage 21, the structure becomes simple, which canfurther reduce the weight of the device as well as cut the productioncost, and also reduce the probability of a breakdown. Further, becausecenter of gravity CG of fine movement stage 21 becomes lower due tointegrating weight cancellation device 40′ and fine movement stage 21,it becomes possible prevent the center of gravity from rising even ifthe size of substrate holder PH increases.

Further, according to exposure apparatus 110, because X guide 102 whichis a member extending in the X-axis direction is supported from below ata plurality of points by the pair of beds 12, this restrains the bendingcaused by the self-weight of X guide 102 or the load of weightcancellation device 40.

Further, because weight cancellation device 40′ is separated from coarsemovement stage 23, vibration which occurs when moving weightcancellation device 40 does not travel to X guide 102. Accordingly,vibration does not travel, for example, to the projection optical systemvia X guide 102, the pair of substrate stages 12, substrate stagemountings 19 and the like, which allows the exposure operation to beperformed with high precision.

Third Embodiment

Next, a third embodiment will be described, with reference to FIGS. 14to 16. Because substrate stage PSTb related to the third embodiment hasa configuration that is almost the same as substrate stage PSTa (referto FIG. 9 and the like) of the second embodiment described above exceptfor the point that the driving method of X guide 102 is different, thesame or similar reference numerals will be used for the same or similarsections as in the second embodiment, and a description thereabout willbe simplified or omitted.

While Y carriage 75 was fixed to both side surfaces of X beam 101 in thesecond embodiment described above, in the third embodiment, Y carriage75 is fixed to the lower surface of X beam 101 similar to exposureapparatus 10 previously described, as shown in FIG. 15. Therefore, theheight of base frame 14 (the same reference code is used for the sake ofconvenience) is lower when compared with the second embodiment. Thisallows substrate stage PSTb to be compactly arranged.

Further, while X guide 102 was driven electromagnetically by the pair ofY linear motors 82 in the first and second embodiments described above,in the third embodiment, X guide 102 is connected to X beam 101mechanically by a device referred to as a pair of flexure devices 107via a connecting member 199 in the vicinity of both ends in thelongitudinal direction as shown in FIG. 14. Incidentally, for the sakeof clarity, a pair of plates 76 (refer to FIG. 9) connecting a pair of Xbeams 101, and fine movement stage 21 (refer to FIG. 8) are notillustrated in FIG. 14.

Each flexure device 107 includes a thin steel sheet (e.g., a flatspring) extending in the Y-axis direction placed parallel to the XYplane, and is built between. X beam 101 and X guide 102 via africtionless joint device such as ball joints. Flexure device 107connects X beam 101 and X guide 102 in the Y-axis direction with highrigidity by the rigidity of the steel sheet in the Y-axis direction.Accordingly, X guide 102 moves in the Y-axis direction integrally with Ycoarse movement stage 23Y, by being pulled by either of the pair of Xbeams 101 via flexure device 107. On the contrary, because each flexuredevice 107 does not restrict X guide 102 to X beam 101 in directions offive degree of freedom excluding the Y-axis direction due to theflexibility (or flexibleness) of the steel plate and the operation ofthe frictionless joint device, vibration hardly travels to X guide 102via X beam 101. Further, the plurality of flexure device 107 connect thepair of X beams 101 and X guide 102 within a plane of X guide 102 thatincludes the position of the center of gravity and is parallel to the XYplane. Accordingly, when X guide 102 is pulled, moment in the θxdirection does not act on X guide 102.

In substrate stage PSTb in the third embodiment, because a configurationof X beam 101 pulling X guide 102 via flexure device 107 was employed inaddition to the effect that can be obtained with substrate stage PSTa inthe second embodiment, the cost is lower than in the case, for example,when an actuator is provided to drive X guide 102. Further, measurementsystems (e.g., a linear encoder and the like) to obtain positionalinformation of X guide 102 will not be necessary. Further, because thedimension in the X-axis direction of X guide 102 can be shorter whencompared with the second embodiment, the cost can be reduced.Furthermore, because the pair of base frames 14 are placed inside onboth sides in the X-direction when compared with the second embodiment,the device becomes compact.

Further, because flexure device 107 has a structure (shape and material)whose rigidity is extremely low except for the Y-direction, vibrationcaused by a force travelling in directions other than the Y directionhardly travels to X guide 102, which makes fine movement stage 21 havegood controllability. Even if vibration in the Y-direction intrudes Xguide 102, because connection of a force in the horizontal direction iscut off between X guide 102 and weight cancellation device 40′ by basepads 44 which are static gas bearing members installed on the lowersurface of weight cancellation device 40′, the vibration does not affectfine movement stage 21. Further, because connection of a force in the Ydirection between X guide 102 and bed 12 is suppressed (the force in theY direction is released) by a Y linear guide 71A, the force does notaffect bed 12 (the main section of the device). Similarly, it is amatter of course that the pair of X beams 101 of substrate stage devicePST and X guide 102 related to the first embodiment previously describedcan be connected, using a pair of flexure devices 107.

Fourth Embodiment

Next, a fourth embodiment will be described, with reference to FIG. 17.Because substrate stage PSTc related to the fourth embodiment has aconfiguration that is almost the same as substrate stage PSTa (refer toFIG. 9 and the like) of the second embodiment described above except forthe point that the driving method of X guide 102 is different, the sameor similar reference numerals will be used for the same or similarsections as in the second embodiment, and a description thereabout willbe simplified or omitted.

As shown in FIG. 17, in substrate stage PSTc, each of a pair of X beams101 has two pusher devices 108 that are spaced apart in the X-axisdirection on an opposing surface that face each other. In other words, atotal of four pusher devices 108 are provided. Each pusher device 108has a steel ball which faces the side surface on the +Y side of X guide102, or the side surface on the −Y side. While the steel ball isnormally spaced apart from X guide 102, in substrate stage PSTc, when Ycoarse movement stage 23Y is driven in the Y-axis direction, pusherdevice 108 is pushed, which pushes X guide 102, and this makes Y coarsemovement stage 23Y integrally move with X guide 102 in the Y-axisdirection. Incidentally, each pusher device 108 does not necessarilyhave to be provided in X beam 101, and for example, can be installed onthe X-axis direction inner side and the Y-axis direction inner side of Ycarriage 75 so as to push X guide 102.

Further, in substrate stage PSTc, after Y coarse movement stage 23Yperforms a Y step movement of X guide 102 to a predetermined position, Ycoarse movement stage 23Y is driven in a direction away from X guide 102to keep vibration from travelling, and this vibrationally separates theY coarse movement stage 23Y and X guide 102. As a method ofvibrationally separating Y coarse movement stage 23Y and X guide 102,for example, X beam 101 can be finely driven appropriately, or actuatorssuch as air cylinders which are not illustrated that finely drive thesteel balls in the Y-axis direction can be provided in pusher device10B. Further, as the pusher device, instead of the steel balls, aspheroid which is rotatable by 90 degrees around the Z-axis or theX-axis can be provided, and by rotating the spheroid appropriately, agap in the Y-axis direction between X guide 102 and Y coarse movementstage 23Y can be changed (switch between a contact state and anon-contact state according to the rotational amount of the spheroid).

In the fourth embodiment, at the time of exposure operation except forthe time when X guide 102 moves in the cross-scan direction, amechanical connection between X beam 101 and X guide 102 is eliminated,which can completely prevent disturbance from entering X guide 102.Similarly, it is a matter of course that pusher device 108 can beprovided in one of the pair of X beams 101 and X guide 102 in substratestage device PST related to the first embodiment previously described.

Incidentally, the configuration of the substrate stage device equippedin the exposure apparatus of the first to fourth embodiments describedabove are mere examples, and the configuration is not limited to these.Modified examples of the weight cancellation device and the levelingdevice which the substrate stage device has will be described below.Incidentally, in the description below, for the sake of simplicity inthe description and convenience in illustration, only the levelingdevice and the weight cancellation device will be described, and forsections having a similar configuration as in the second embodimentdescribed above, the same reference numerals will be used as in thesecond embodiment described above and a description thereabout will beomitted.

FIRST MODIFIED EXAMPLE

FIG. 18 shows a weight cancellation device 40A and a leveling device 57Athat the substrate stage device related to a first modified example has.In the first modified example, while leveling device 57A and weightcancellation device 40A have a configuration similar to the secondembodiment, leveling device 57A is placed so as to support weightcancellation device 40A from below (in other words, the placement ofleveling device 57 and weight cancellation device 40′ of the secondembodiment takes a form of being vertically switched). To be concrete,the lower surface of housing 41 is connected to the upper surface ofpolyhedron member 64. Further, although it is omitted in FIG. 18, theupper surface of Z slider 43 of weight cancellation device 40A is fixedto fine movement stage 21 via spacer 51.

In the substrate stage device related to the first modified example, thecontrollability is improved compared with each of the embodimentsdescribed above, by providing weight cancellation device 40A above ofleveling device 57A so that components between polyhedron member 64 andbase pad 44 are reduced, the weight is reduced, and the inertial masslower than polyhedron member 64 (from polyhedron member 64 to base pad44) decreases at the time of horizontal movement such as at the time ofscanning, and since the position of the center of gravity nears thedriving point (a point where polyhedron member 64 and air bearing 65come into contact), rigidity in the θx and θy directions increases(becomes stronger to vibration).

SECOND MODIFIED EXAMPLE

FIG. 19 shows a weight cancellation device 40B and a leveling device 57Bthat the substrate stage device related to a second modified examplehas. The second modified example is configured similar to the firstmodified example (refer to FIG. 18), except for vertically switching theposition of air spring 42 and Z slider 43 (with parallel plate springdevice 48). In weight cancellation device 40B, housing 41B consists of acylinder-like member whose lower surface is open and has a bottom, andthe upper surface of housing 41B is integrally fixed to fine movementstage 21 (not illustrated in FIG. 19).

In the substrate stage device related to the second modified example, inaddition to the effect obtained in the first modified example, becausethe position of parallel plate spring device 48 becomes lower and isarranged at a position closer to the center of gravity of weightcancellation device 40B, the stability of the exposure operationimproves.

THIRD MODIFIED EXAMPLE

FIG. 20 shows a weight cancellation device 40C that the substrate stagedevice related to a third modified example has. Weight cancellationdevice 40C is configured of a body 41C which is a cylinder-like memberwhose upper surface is open and has a bottom, an air spring 42 housedinside body 41C, a leveling cup 49 connected to the upper surface of airspring 42, a plurality of air bearings 64, a polyhedron member 64 whichis fixed to a fine movement stage 21 that is not illustrated and thelike. In the third modified example, the Z slider is removed, and aconfiguration in which the lower surface of leveling cup 49 is pushed inthe Z-axis direction directly by air spring 42 is employed. To the outerwall surface of body 41C, a plurality of arm members 47 are fixed tosupport a target 46.

Adding to the roles similar to the ones described in the secondembodiment described above, leveling cup 49 also plays the role of Zslider 43 (refer to FIG. 13) in the second embodiment and the likedescribed above. Therefore, on the upper end surface and lower endsurface of the outer periphery of leveling cup 49, a plurality of (e.g.,four each on the upper end surface, the lower end surface, and evenly inthe circumferential direction) parallel plate springs 67 e are connected(however, parallel plate spring 67 e placed on the ±X side is notillustrated so as to avoid intricacy of the drawings). This restrictsrelative movement of leveling cup 49 in the horizontal direction withrespect to body 41C, and only a vertical slide becomes possible.

In the substrate stage device related to the third modified example,because the Z slider will not be necessary, the configuration of weightcancellation device 40C becomes more simple, which allows the substratestage device to be lighter and to be manufactured at a lower cost whencompared with each of the embodiments described above.

Further, because the proximity of the upper and lower end surfaces ofleveling cup 49, which is relatively large in size and the dimension inthe Z-axis direction is large among the components installed belowpolyhedron member 64 and are oscillated (vibrated) at the time ofoperation, is connected by parallel plate springs 67 e so that levelingcup 49 cannot move relatively in the horizontal direction with respectto body 41C, the rigidity of the lower section in the θx and θydirections of polyhedron member 64 becomes higher, which suppresses theoscillation of the components installed below polyhedron member 64caused by the inertia at the time of horizontal movement, and improvesthe controllability.

Further, because leveling cup 49 moves only in the Z direction whilemaintaining high straightness with respect to body 41C by the operationof parallel plate spring 67 e, the bottom surface of leveling cup 49does not have to be fixed to the upper surface (metal plate) of airspring 42, which makes the assembling and disassembling easy, improvingthe workability.

Further, because the Z-axis direction drive by air spring 42 and theleveling drive (θx, θy) by polyhedron member 64 can be controlledindependently (do not interfere), controllability is good.

Incidentally, weight cancellation device 40A to 40C related to each ofthe modified examples described above is not limited to an XY two-axisstage, and can also be applied to an X-axis (or a Y-axis) single axisstage, or a conventional XY two-axis stage in which a Y coarse movementstage is mounted on an X coarse movement stage.

Further, in the second to fourth embodiments described above (and eachof the modified examples described above), while Z slider 43 or levelingcup 49 of the weight cancellation device were movable only in the Z-axisdirection by placing a plurality of parallel plate spring devices 48,beside this, for example, air bearings or rolling guides can also beused.

Further, in the second to fourth embodiments (and each of the modifiedexamples described above) described above, while the configuration wasemployed in which X coarse movement stage 23X was mounted on Y coarsemovement stage 23Y, as well as this, when focusing only on reducing thesize of weight cancellation device 40 and integrating weightcancellation device 40 with fine movement stage 21, coarse movementstage 23Y can be mounted on X coarse movement stage 23X as in theconventional device. In this case, weight cancellation device 40performs a step movement in the Y-axis direction on a member(tentatively called a Y-guide) which is X guide 102 used in theembodiment but is placed so that the longitudinal direction is in theY-axis direction, and further in the X-axis direction which is thescanning direction, the whole Y guide moves.

Further, in the second to fourth embodiments (and each of the modifiedexamples described above) described above, while X guide 102 isinstalled on substrate stage mountings 19 which are a part of the mainsection (body) of the apparatus via the pair of beds 12, as well asthis, a plurality of Y linear guides 71A can be fixed directly onsubstrate stage mountings 19 as in substrate stage PSTd shown in FIG.22. This allows bed 12 (refer to FIG. 8) to be omitted, which furtherreduces the weight of the whole exposure apparatus, and furthermoredecreases the overall height (dimension in the Z-axis direction). Thesame applies to the first embodiment described above.

Further, in each of the first embodiment or the fourth embodimentdescribed above (and each of the modified examples described above),while X guide 102 was supported from below by two beds 12, as well asthis, the number of beds 12 can be three or more In this case, auxiliaryguide frame 103 arranged in between adjacent beds 12 can be increased.Further, in the case the movement amount in the X-axis direction ofsubstrate P is small (or when substrate P itself is small), the numberof beds 12, can be one. Further, as for the shape of bed 12, length ofthe Y-axis direction was set than the length of the X-axis direction fora long time, but length of the X-direction may be longer without beinglimited to this. Furthermore, the plurality of beds can be placed apartin the X-axis and/or the Y-axis direction.

Further, in the case the bending of X guide 102 is small enough to beignored, auxiliary guide frame 103 does not have to be installed.

Further, in the embodiment described above, while the configuration inwhich the plurality of Y linear guides 71A are fixed on the pair of beds12 and X guide 102 moves thereon in the Y-direction along Y linearguides 71A is employed, as well as this, for example, a plurality ofstatic gas bearings or rollers can be provided on the lower surface of Xguide 102 so that X guide 102 can move over beds 12 with low friction.However, to maintain the distance constant between Y mover 72A and Ystator 73, it is desirable to have some kind of a device that limits themovement of X guide 102 in the X-axis direction with respect to the pairof beds 12. As the device to limit the movement of X guide 102 in theX-axis direction, for example, a static gas bearing or a mechanicalsingle axis guide can be used. By this arrangement, the positionadjustment operation to place the plurality of Y linear guides 71Aparallel to each other will not be required, which makes assembly of thesubstrate stage device easy.

Further, a device (clearance device) which makes X guide 102 and Yslider 71B relatively movable in the X-axis direction by a minimaldistance can be provided, for example, in between X guide 102 and Yslider 71B. In this case, even if the plurality of Y linear guides 71Aare not placed parallel to each other, X guide 102 can advance smoothlystraight in the Y-axis direction on a plurality of Y linear guides 71A.As the device which makes X guide 102 and Y slider 71B relativelymovable in the X-direction, for example, a hinge device can be used. Asimilar clearance device can also be provided in other linear guidesdevices. Further, in a similar manner, a device which makes the pair ofX beams 101 and Y carriage 75 relatively movable by a minimal distancein the X-axis direction can be provided. In this case, even if the pairof base frames 14 are not placed collimated, the pair of X beams 101 canadvance smoothly straight in the Y-axis direction.

Further, as shown in FIG. 21A, in the first and second embodimentsdescribed above, a pair of Y carriage 83 which has a J shape and areversed J-shape in the XZ section, respectively, can be attached toboth of the ends of X guide 102, and Y mover 72A can further he fixed toeach of the Y carriages 83. In this case, a magnetic attractive forcebetween the magnet unit that Y stator 73 (refer to FIGS. 1 and 8) hasand the coil unit that Y mover 72A has acts equally on base frame 14,which prevents a slant of base frame 14. Further, thrust to drive Xguide 102 also improves. Incidentally, in the first and secondembodiments described above, while the plurality of linear motors areall motors using a moving coil method, as well as this, motors that usea moving magnet method can also be used. Further, in the embodimentsother than the second embodiment described above, the drive device usedto drive Y carriage 75 in the Y-axis direction is not limited to alinear motor, and a ball screw type drive device, a belt type drivedevice, or a rack and pinion type drive device can also be used.

Further, in the first and second embodiments above, while Y stator 73(refer to FIGS. 1 and 8) fixed to base frame 14 was used in common bythe Y linear motor used to drive X guide 102 and the Y linear motor usedto drive Y coarse movement stage 23Y, each of the Y linear motors can beconfigured separately. Further, the Y stator of the Y linear motor usedto drive Y coarse movement stage 23Y can be fixed to auxiliary guideframe 103, and the Y mover can be attached to auxiliary carriage 78.

Further, in the first and second embodiments described above, while bothof the ends in the X-direction of the pair of X beams 101 weremechanically connected, for example, by plate 76, as well as this, forexample, the ends can be connected also by a member that has a crosssectional area about the same as X beam 101. Further, the Z-axisdimension of X guide 102 (guide main section 102 a) can be larger thanthe Z-axis dimension of each of the pair of X beams 101. In this case,the Z-axis dimension of weight cancellation device 40 can be madeshorter.

Further, in the first and second embodiments described above, forexample, while two (a total of 4) Y carriages 75 were provided on the +Xside and the −X side of Y coarse movement stage 23Y, respectively, aswell as this, for example, one Y carriage 75 can be provided, on the +Xside and the −X side of Y coarse movement stage 23Y, respectively. Inthis case, if the length of Y carriage 75 is equal to plate 76, plate 76will not be necessary. Incidentally, in the Y carriage in this case, anotch into which Y mover 72A attached to both ends in the X-axisdirection of X guide 102 is inserted is formed.

Further, in each of the embodiments described above, while the pair of Xbeams 101 were mechanically connected, as well as this, the pair of Xbeams 101 can be mechanically separated. In this case as well, each ofthe pair of X beams 101 can be synchronously controlled.

Further, in the fourth embodiment described above, while X guide 102 waspushed in a contact state to X beam 101 via pusher device 108, as wellas this, a configuration where X guide 102 is pushed to X beam 101 in anon-contact state can be employed. For example, as shown in FIG. 21B, athrust type air bearing 109 (an air pad) should be attached to X beam101 (or X guide 102), and X guide 142 should be pushed in a non-contactmanner by the static pressure of the gas blowing out from the bearingsurface. Or, as shown in FIG. 21C, permanent magnets 100 a and 100 b (apair of permanent magnets 100) can be attached to X beam 101 and X guide102, respectively, so that the magnetic pole of the part opposing eachother becomes the same, and X guide 102 can be pushed in a non-contactmanner by a repulsive force (repulsion) that occurs between the opposingmagnets. In the case of using such a pair of permanent magnets 100, theconfiguration of the device becomes simple because pressurized gas,electricity and the like do not have to be supplied. A plurality of(e.g., two) both the thrust type air bearings 109 and the pair ofpermanent magnets 100 described above should be provided distanced apartin the X-axis direction, each in between X beam 101, and X guide 102 onthe +Y side and X beam 101 and X guide 102 on the −Y side.

Fifth Embodiment

Next, a fifth embodiment will be described, referring to FIGS. 23 to 28.

Except for the point that a substrate stage device PSTe is providedinstead of substrate stage device PST in the exposure apparatus relatedto the fifth embodiment, the exposure apparatus is configured similar toexposure apparatus 10 of the first embodiment.

The description below will be focusing mainly on substrate stage devicePSTe. Herein, the same or similar reference signs are used for thecomponents that are the same as or similar to those in exposureapparatus 10 related to the first embodiment previously described, andthe description thereabout is simplified or omitted.

In the exposure apparatus related to the fifth embodiment, instead ofthe substrate stage having a coarse/fine movement configurationpreviously described, as is shown in FIGS. 23 and 24, a substrate stagedevice PSTe is used, which is equipped with a so-called gantry typetwo-axis stage (substrate stage) ST that has a joist (beam) shaped Xstage STX which moves in the X-axis direction whose longitudinaldirection is in the Y-axis direction and a Y stage STY that holdssubstrate (plate) P on X stage STX and moves in the Y-axis direction.Although it is not illustrated, substrate stage device PSTe is placedbelow (on the −Z side) projection optical system PL (not illustrated inFIGS. 23 and 24, refer to FIG. 1) as in substrate stage device PSTpreviously described.

Substrate stage device PSTe is equipped with a substrate stage ST and asubstrate stage drive system PSD (not illustrated in FIGS. 23 and 24,refer to FIG. 25) which drives substrate stage ST. As shown in FIGS. 24and 25, substrate stage drive system PSD is equipped with a pair ofX-axis drive units XD1 and XD2 that drive X stage STX in the X-axisdirection, and a Y-axis drive unit YD which drives Y stage STY on Xstage STX in the Y-axis direction. Y stage STY holding substrate P isdriven in predetermined strokes in an X-axis direction and the Y-axisdirection by substrate stage drive system PSD.

Specifically, as shown in FIGS. 23 and 24, substrate stage device PSTeis equipped with a total of six leg sections 61 a to 61 f installedalongside in the XY two-dimensional direction on floor surface F in theclean room where the exposure apparatus is installed, two base blocks 62a and 62 b supported by three each of the leg sections 61 a to 61 c, and61 d to 61 f, the pair of (two) X-axis drive units XD1 and XD2 providedin the two base blocks 62 a and 62 b, respectively, X stage STX drivenin the X-axis direction by the two X-axis drive units XD1 and XD2,Y-axis drive unit YD provided on X stage STX, and Y stage STY driven inthe Y-axis direction by Y-axis drive unit ID and the like.

As shown in FIG. 23, leg sections 61 a to 61 c are placed at apredetermined distance in the X-axis direction. Similarly, leg sections61 d to 61 f are each placed at a predetermined distance in the X-axisdirection, on the +Y side (in the depth of the page surface in FIG. 23)of each of the leg sections 61 a to 61 c. To each of the bottom sectionsof leg sections 61 a to 61 f, four each of adjustment tools 61 a ₀ to 61f ₀ are provided. As it can be seen from FIGS. 23 and 24, for example,in leg sections 61 b, two each of adjustment tools 61 b ₀ are providedin the bottom section on the ±Y side surface.

Leg sections 61 a to 61 c and 61 d to 61 f support base blocks 62 a and62 b that are placed parallel to each other by a predetermined distancein the Y-axis direction, respectively, with the X-axis direction servingas the longitudinal direction. Ease blocks 62 a and 62 b are supportedparallel to a plane orthogonal to the earth's axis (direction ofgravitational force), also at the same height from floor surface F, forexample, by being appropriately adjusted by adjustment tools 61 a ₀ to61 f ₀ provided in each of the leg sections 61 a to 61 f using a level.

As shown in FIG. 24, X-axis drive units XD1 and XD2 are provided in baseblocks 62 a and 62 b, respectively. X-axis drive units XD1 and XD2support the −Y end and the +Y end of X stage STX from below,respectively, and drives X stage STX in the X-axis direction.

As is shown in FIGS. 23 and 24, one of the X-axis drive unit XD1 (on the−Y side) includes a plurality of fixed members 63 and one movable member84, a pair of linear motors XDM1 and XDM2 which generate a drive forcein the X-axis direction, a pair of guide devices XG1 and XG2 that limitthe movement of X stage STX in directions other than the X-axisdirection, a linear encoder EX1 (refer to FIG. 25) which measures theposition of the movable member (X stage STX) in the X-axis directionwith respect to fixed member 63 (base block 62 e )

As shown in FIGS. 23 and 24, at the edge on the ±Y sides of base block62 a, a plurality of (10 each in the present embodiment) fixed members63 are each fixed alongside in the X-axis direction. Incidentally, forthe sake of clarity, in FIG. 23, a part of the plurality of fixedmembers 63 (including a stator XD12 which will be described later on) onthe −Y side is not illustrated, or is shown in a partially broken view.Each fixed member 63 is fixed to a side surface of base block 62 a usinga fixture (bolt) 63 ₀ whose −Z edge is a fastener. In this case, theinner side surface of each fixed member 63 is tilted (forms an angle θwith respect to the XY plane) inward by an angle π/2−θ with respect tothe XZ plane, as shown in FIG. 26. As a result, the YZ sectional shapeof a member which is a combination of base block 62 a and fixed member63 is a rough U shape (however, the distance between a pair of opposingsurfaces is smaller on the +Z side (opening side) than the −Z side).

As shown in FIG. 24, movable member 84 consists of a prismatic memberhaving a YZ section of a isosceles trapezoidal shape, and is placed sothat its upper surface and lower surface is horizontal (parallel to theXY plane) and the longitudinal direction is in the movable direction(the X-axis direction). Movable member 84 is attached to a stationaryplate 66 fixed by fixture (bolt) 66 ₀ to the lower surface (the −Zsurface) of X stage STX in the vicinity of the −Y edge, via a riser(rising) block 85 that has a rectangular YZ section and is fixed on theupper surface of movable member 84.

Movable member 84 is placed in a space formed by base block 62 a andfixed member 63. In this case, the ±Y side surface of movable member 84is tilted (forms en angle θ with respect to the XY plane) by an angleπ/2−θ with respect to the XZ plane. In other words, the surface on the+Y side of movable member 84 is parallel to and faces the surface on the−Y side of fixed member 63 on the +Y side by a predetermined distance,and the surface on the −Y side of movable member 84 is parallel to andfaces the surface on the +Y side of fixed member 63 on the −Y side by apredetermined distance. Movable member 84 has a hollow structure so asto reduce its weight. Incidentally, the ±X ends of movable member 84 donot necessarily have to be parallel. Further, the YZ section does notnecessarily have to be a trapezoidal shape. Further, if the surfacewhere movers XD11 and XD21 which will be described later are fixed to isshaped tilted by an angle π/2−θ]with respect to the XZ plane (theZ-axis), corners of movable member 84 can be chamfered.

As shown in FIG. 24, linear motor XDM1 is configured of a mover XD11 anda stator XD12, and linear motor XDM2 is configured of mover XD21 andstator XD22.

As shown in FIG. 24, the pair of stators XD12 and XD22 described aboveare fixed to the inner side surface of fixed members 63 on the ±Y side,respectively, and are provided extending (stator XD12 is not illustratedin FIG. 23) in the X-axis direction as shown in. FIG. 23. Incidentally,as shown in FIG. 23, stators XD12 and XD22 (stator XD12 is notillustrated in FIG. 23) are not fixed to fixed members 63 locatedoutermost on the +X side and −X side. The pair of movers XD11 and XD21described above are fixed to both side surfaces on the ±Y side ofmovable member 84, respectively, and movers XD11 and XD21 face statorsXD12 and XD22 which are fixed to fixed members 63 where both sidesurfaces faces and the Z-axis (XZ plane), with a slight gap in adirection where an angle θ is made.

Further, although it is not illustrated, inside each of the movers XD11and XD21, a plurality of coil units (including a plurality of coils thatare each wrapped around a core (iron core)) are arranged in the X-axisdirection. Inside each of the stators XD12 and XD22, a plurality ofmagnet units (each including a plurality of permanent magnets) arearranged in the X-axis direction. In the fifth embodiment, mover XD11and stator XD12 configure a moving coil type linear motor XDM1, andmover XD21 and stator XD22 configure a moving coil type linear motorXDM2.

Guide device XG1 includes an X-axis linear guide (rail) XGR1 and twosliders XGS1 as shown in FIGS. 23 and 24. Similarly, guide device XG2includes an X-axis linear guide (rail) XGR2 and two sliders XGS2.

Specifically, a groove of a predetermined depth is provided extending inthe X-axis direction on the upper surface of base block 62 a, and fromthe center in the Y-axis direction of the inner bottom surface of thegroove section at a position spaced apart at substantially the samedistance on the ±Y sides, X-axis linear guides XGR1 and XGR2 that extendin the X-axis direction are fixed parallel to each other. Two each ofsliders XGS1 and XGS2 are fixed to the lower surface of movable member84, at positions facing X-axis linear guides XGR1 and XGR2,respectively. In this case, sliders XGS1 and XGS2 have an invertedU-shaped section, while the two sliders XGS1 on the −Y side engages withX-axis linear guide XGR1, the two sliders XGS2 on the +Y side engageswith X-axis linear guides XGR2. In the vicinity of the ±X ends of eachof the X-axis linear guides XGR1 and XGR2, as shown in FIG. 23, stoppingdevices 88 and 99 are provided to prevent an overrun of X stage STX.

As shown in FIG. 24, linear encoder EX1 includes a head EXh1 and a scaleEXs1. On the surface of scale EXs1, a reflection diffraction grating isformed whose periodic direction is in the X-axis direction, and isprovided extending in parallel with X-axis linear guides XGR1 and XGR2in the center in the Y-axis direction of the inner bottom surface of thegroove of base block 62 a. Head EXh1 is provided on the lower surface(or the side surface on the +X side (or the −X side)) of movable member84. Head EXh1 faces scale EXs1 within the movement strokes of movablemember 84 (X stage STX) in the X-axis direction, irradiates ameasurement light on scale EXs1, and by receiving the reflectiondiffraction lights from scale EXs1, measures positional information inthe X-axis direction of movable member 84 (the −Y end of X stage STX)with respect to base block 62 a. The measurement results are transmittedto math controller 50 (refer to FIG. 25).

The other (on the +Y side) X-axis drive unit XD2 is configured almostthe same as X-axis drive unit XD1 described above. However, movablemember 84 included in X-axis drive unit XD2 is attached to stationaryplate 66 using fixture 66 ₀ on the lower surface (the −Z side) in thevicinity of the +Y end of X stage STX, via a parallel plate spring 86which is provided instead of riser (rising) block 85. Parallel platespring 86 is configured by a pair of plate springs which are placed apredetermined distance apart in the Y-axis direction whose longitudinaldirection is in the X-axis direction that is parallel to the XZ plane.Parallel plate spring 86 allows relative movement of stationary plate 66and movable member 84 in fine strokes in the Y-axis direction.Therefore, even if parallelism decreases between base block 62 a andbase block 62 b, load to guide device XG3 (configured by slider XGS3 andX-axis linear guide (rail) XGR3) which will be described later isreduced by the operation of parallel plate spring 86.

Further, to the upper surface of fixed member 63, a cover B7 is attachedwhich allows distortion of parallel plate spring 86 that occurs onrelative movement of stationary plate 66 and movable member 84 in finestrokes in the Y axis=direction as described above, and covers theopening of the upper surface. Similarly, to the upper surface of fixedmember 63 on the X-axis drive unit XD1 side previously described, acover 87 is attached which allows the movement of riser block 85 in theY-axis direction that occurs due to distortion of parallel plate spring66, and also covers the opening of the upper surface. By these covers87, diffusion of heat generated by the coil units inside the pair ofmovers XD11 and XD21 that X-axis drive units XD2 and XD1 have outside ofX-axis drive units XD2 and. XD1 can be prevented.

In X-axis drive unit XD2, as shown in FIG. 24, only one guide device XG3is provided, configured of one X-axis linear guide XGR3 and two slidersXGS3 that engage with X-axis linear guide XGR3 as in guide devices XG1and XG2. In X-axis drive unit XD2, a linear encoder EX2 configured of ahead EXh2 and a scale EXs2 is provided, as in linear encoder EX1previously described. Linear encoder EX2 measures positional informationin the X-axis direction of movable member 84 with respect to base block62 b. The measurement results are transmitted to main controller 50(refer to FIG. 25).

Furthermore, X-axis drive units XD1 and XD2 each have a fan 70A and afan 70B at the edge on the −X side and the edge on the +X side, as shownin FIG. 23. Fan 70A is an air-supply fan which takes in outside air(air) into the inner space (the space in between base block (62 a or 62b ) and the pair of fixed members 63) of the X-axis drive unit, and fan70B is an air exhaust fan which exhausts the air that passes through theinner space of the X-axis drive unit outside. By these fans 70A and 70B,the coil units inside the pair of movers XD11 and XD21 provided in theinner space of each of the X-axis drive units XD1 and XD2 can be cooledefficiently.

In this case, load (and an inertia force which accompanies the movementof the load) of X stage STX and Y stage STY supported thereon and thelike is applied to X-axis drive units XD1 and XD2. Further, in linearmotors XDM1 and XDM2 included in X-axis drive units XD1 and XD2, amagnetic attractive force which is several times the drive force isgenerated between each of the movers and stators. In this case, themagnetic attractive force acting on the mover with respect to the statoracts as a floatation force (a force in a direction of anti-gravitationalforce) to movable member 84. X-axis drive units XD1 and XD2substantially cancel out the load described above using the magneticattractive force (floatation force), and support and drive X stage STXwithout a large load (and an inertia force) being applied to guidedevices XG1 to XG3. Incidentally, the offset (balance) in X-axis driveunit XD1 (XD2) between the load such as the X stage STX and the magneticattractive force (floatation force) from linear motors XDM1 and XDM2will be described in detail later on.

On X stage STX, as shown in FIG. 23, Y stage STY is supported via aguide device YG which configures a part of Y-axis drive unit YD.Substrate P is held on Y stage STY.

As shown in FIG. 23, Y-axis drive unit YD includes linear motor YDMwhich generates a drive force in the Y-axis direction, guide device YGwhich limits the movement of Y stage STY in directions other than theY-axis direction, and linear encoder EY (refer to FIG. 25) whichmeasures the position of Y stage STY in the Y-axis direction withrespect to X stage STX.

Linear motor YDM includes a mover YD1 and a stator YD2, as shown in FIG.23. Stator YD2 is provided extending in the Y-axis direction, in thecenter of the X-axis direction on the upper surface of X stage STX.Mover YD1 is fixed in the center in the X-axis direction on the bottomsurface of Y stage STY, facing stator YD2 and the Z-axis direction.

Guide device YG includes a pair of Y-axis linear guides (rails) YGR andfour sliders YGS (partially not illustrated in FIG. 23). Each of thepair of Y linear guides YGR is provided extending in the Y-axisdirection, parallel to each other in the vicinity of an edge on the −Xside and the +X side on the upper surface of X stage STX. The foursliders YGS are each fixed in the vicinity of the four corners on thelower surface of Y stage STY. In this case, the four sliders YGS have anXZ sectional surface which is an inverted U-shape, and of the foursliders, two sliders YGS located on the −X side engage with Y-axis,linear guide YGR on the −X side on X stage STX, and two sliders YGSlocated on the +X side engage (refer to FIG. 24) with Y-axis linearguide YGR on the +X side on X stage STX.

Linear encoder EY (refer to FIG. 25) is configured of a head and ascale. The scale (not illustrated) has a reflective diffraction gratingwhose periodic direction is in the Y-axis direction formed on itssurface, and is provided extending parallel to the Y-axis linear guideYGR on X stage STX. The head (not illustrated) is provided on the lowersurface (or on a side surface on the +Y side or the −Y side)) of Y stageSTY. The head faces the scale within the movement strokes in the Y axisdirection of Y stage STY, and irradiates a measurement light on thescale, and by receiving the reflection diffraction light from the scale,measures positional information in the Y-axis direction of Y stage STYwith respect to X stage STX. The measurement results are transmitted tomain controller 50 (refer to FIG. 25)

The positional information (including yawing (rotation θz in the θzdirection)) of substrate stage ST (Y stage STY) in the XY plane isconstantly measured by encoder system 20 (refer to FIG. 25) configuredof linear encoders EX1 and EX2 included in each of the X-axis driveunits XD1 and XD2 described above, and linear encoder EY included inY-axis drive unit YD.

Further, independently from encoder system 20, substrate interferometersystem 92 measures the positional information (including θz) in the XYplane of Y stage STY (substrate stage ST) and information on the amountof inclination (pitching (rotational amount in the θx direction) androlling (rotational amount in the θy direction)) with respect to theZ-axis, via a reflection surface (not illustrated) provided (or formed)in Y stage STY. Measurement results of substrate interferometer system92 are supplied to main controller 50 (refer to FIG. 25).

Main controller 50 drives and controls substrate stage ST (Y stage STYand X stage STX) via substrate stage drive system PSD (refer to FIG. 25)for to be more precise, via linear motors XDM1, XDM2, and YDM thatconfigure a part of X-axis drive units XD1, XD2, and Y-axis drive unitID, respectively, based on the measurement results of encoder system 20and/or substrate interferometer system 92.

FIG. 25 shows a block diagram showing an input/output relation of maincontroller 50, which centrally configures a control system of theexposure apparatus related to the fifth embodiment and has overallcontrol over each part. Main controller 50 includes a workstation (or amicrocomputer) and the like, and has overall control over each part ofexposure apparatus.

Next, the balance in X-axis drive unit XD1 (XD2) between the load suchas the X stage STX and the magnetic attractive force (floatation force)from linear motors XDM1 and XDM2 described above will be described.Incidentally, because the balance of the load and the floatation forcedescribed above is the same in X-axis drive unit XD1 and X-axis driveunit XD2, in the description below, X-axis drive unit XD1 will bedescribed.

As shown in FIG. 26, in a state where X stage STX (refer to FIG. 24) isstationary, a load W which is half the gross weight of X stage STX, Ystage STY and the like acts downward (a direction shown by an outlinedarrow) in a vertical direction on movable member 84 of X-axis drive unitXD1. At the same time, to movable member 84, a magnetic attractive forceF1 which is generated between mover XD11 and stator XD12 configuringlinear motor XDM1 acts in a direction forming an angle θ with respect tothe Z-axis, and a magnetic attractive force F2 which is generatedbetween mover XD21 and stator XD21 configuring linear motor XDM2 acts ina direction forming an angle −θ with respect to the Z-axis.Incidentally, for example, when Y stage STY is located in the center ofits movable range, load W which is half the gross weight of X stage STX,acts approximately equally on movable member 84 of X-axis drive unit XD1and X-axis drive unit XD2, or, to be more exact, the load in a directiondownward of a vertical direction acting on movable member 84 variesaccording to the position of Y stage STY.

Now, supposing that magnetic attractive forces F1 and F2 generated ineach of the linear motors XDM1 and XDM2 are equal (in other words,F1=F2=F) to each other. Then, a resultant force P=Fz1+Fz2 (=2F cos θ) ofthe vertical direction component of magnetic attractive forces F1 and F2by linear motors XDM1 and XDM2 acts on movable member 84 in an upwardvertical direction (a direction shown by a black arrow). Angle θ is setso that resultant force P becomes approximately equal with load W.Accordingly, a load (remaining force) |W−P| much smaller than load Wwill act on guide devices XG1 and XG2. Incidentally, in the horizontaldirection (the Y-axis direction), because horizontal directioncomponents Fy1 and Fy2 of magnetic attractive forces F1 and F2 arecancelled out, the resultant force does not act (a null resultant forceacts) on movable member 84. Incidentally, because relative movement offixed member 63 and movable member 84 is restricted in the Z-axisdirection (the direction, and the −Z direction) by guide devices XG1 andXG2, the relation between resultant force P and load W described abovecan be P<W, or P>W.

In X-axis drive unit XD1 (XD2) described above, by appropriately settingthe inclination (angle of inclination θ) of the side surfaces of movablemember 84 and fixed member 63 that face each other according to the loadcapacity of guide devices XG1 and XG2, load W acting in the verticaldirection can be cancelled without providing a force in the horizontaldirection to movable member 84, using magnetic attractive forces F1 andF2 of linear motors XDM1 and XDM2.

Meanwhile, a magnetic attractive force (−F1) generated by linear motorXDM1 in a θ direction with respect to the Z-axis acts on fixed member 63fixed to the −Y side of base block 62 a. This attractive force providesa shear force and a bending moment to fixed member 63. Similarly, amagnetic attractive force (−F2) generated by linear motor XDM2 in a −θdirection with respect to the Z-axis acts on fixed member 63 fixed tothe +Y side of base block 62 a. This attractive force provides a shearforce and a bending moment to fixed member 63. Accordingly, both fixedmembers 63 bend inwardly to the fixed end with base block 62 a, and as aresult, the size of a gap between the side surfaces of, fixed member 63and movable member 84 that face each other can vary.

The variation of the size of the gap due to the bending of fixed member63 can be suppressed by optimizing the thickness (the width in theY-axis direction) of fixed member 63.

For example, in the case the drive force (thrust) of X stage STX issmall and load W with respect to magnetic attractive forces F1 and F2(to be precise, a vertically upward resultant force P=2 F cos θ) islarge (W>P), angle of inclination θ is to be se small. This increasesresultant force P, namely the floating force applied to movable member84, which reduces the load (remaining force) |W−P| acting on guidedevices XG1 and XG2. In this case, because the magnetic attractive forceis small, the shear force and bending moment acting on fixed member 63also become small. Therefore, the thickness of fixed member 63 can beset small.

On the contrary, in the case the drive force (thrust) of X stage STX islarge and load W with respect to magnetic attractive forces F1 and F2 (avertically upward resultant force P=2 F cos θ) is small (W<P), angle ofinclination θ is to be set large. This balances resultant force P andload W. In this case, because the magnetic attractive force is largewith respect to a large angle of inclination θ, the shear force andbending moment acting on fixed member 63 become large. Therefore, thethickness of fixed member 63 needs to be set large.

Next, the way to obtain the thickness (the width in the Y-axisdirection) h of fixed member 63 will be described, referring to FIG. 27.As shown in FIG. 27, width of movers XD11 and XD21 and stators XD12 andXD22 will be expressed as s (projection length in the Y-axis directiona=s cos θ), the size of the gap between the side surfaces of fixedmember 63 and movable member 84 that face each other will be expressedas c (projection length in the Y-axis direction d=c sin θ), length inthe X-axis direction of fixed member 63 will be expressed as b, andheight (the distance in the Z-axis direction) from the fixed end offixed member 63 to the center (the center of stators XD12 and XD22) ofthe inner side surface will be expressed as L=(s/2) sin θ+α. However, αis an allowance dimension. Further, the magnetic attractive force isF1=F2=F, namely the floating force acting on movable member 84 isassumed to be P=2 (F cos θ). When Young's modulus (modulus oflongitudinal elasticity) and flexure of fixed member 63 are expressed asE and w, respectively, thickness h of fixed member 63 can be obtained asin the following formula (1), using a relation expression of flexure inthe case a normal-force acts on the tip of a simple cantilever.

$\begin{matrix}{h = \sqrt[3]{\frac{{4 \cdot F \cdot \sin}\;{\theta \cdot L^{3}}}{w \cdot E \cdot b}}} & (1)\end{matrix}$

Incidentally, in order to reduce the size of X-axis drive unit XD1 (moreparticularly, to shorten the width dimension in the Y-axis direction ofX-axis drive unit XD1, the angle of inclination θ should be set so thata+d+h becomes small.

However, as is previously described, in between fixed member 63 andmovable member 84, guide devices XG1 and XG2 are provided so as tosuppress a straightness error (a Y translation error and a Z translationerror) and a rotation/tilt error of movable member 84, and a reactionforce and the like that accompanies the movement of Y stage STY.Accordingly, load W which is applied to movable member 84 does not haveto be completely cancelled out only by flotation force P from linearmotors XDM1 and XDM2.

For example, relation between θ, a, d, h, a+d+h, and flotation force P(=2 F cos θ) when s=100 mm, b=500 mm, c=50 mm, E=16000 kgf/mm2, α=100mm, F=2000 kgf, w=0.1 mm, and W=800 kgf can be obtained as is describedin table 1 below.

TABLE 1 θ a d h a + d + h 2Fcosθ (degree) (mm) (mm) (mm) (mm) (kgf) 1098.5 8.7 13.1 120.3 3939.2 20 94.0 17.1 17.6 128.7 3758.8 30 86.6 25.021.4 133.0 3464.1 40 76.6 32.1 24.6 133.3 3064.2 50 64.3 38.3 27.3 129.92571.2 60 50.0 43.3 29.4 122.7 2000.0 70 34.2 47.0 31.0 112.2 1368.1 8017.4 49.2 32.0 98.6 694.6 85 8.7 49.8 32.2 90.7 348.6 88 3.5 50.0 32.385.8 139.6

From table 1 above, angle θ should be set to θ=70−85 degrees. To loadW=800 kgf, flotation force P=1368.1 to 348.6 kgf, or in other words, theremaining force acting on guide devices XG1 and XG2 is −568.1 to +451.4kgf, which can substantially cancel off load W. Further, because theremaining force can be adjusted extremely small, the size of guidedevices XG1 and XG2 can be reduced. This reduces the frictionalresistance between the X-axis linear guides and the sliders thatconfigure guide devices XG1 and XG2. In other words, the thrust requiredto drive movable member 84 (X stage STX) becomes small, which allows,for example, movable member 84 to be moved manually, and the workingefficiency such as the maintenance of X stage STX can also be improved.Further, by setting the angle of inclination θ large, the size of fixedmember 63, namely X-axis drive unit XD1, can be reduced.

Further, in X-axis drive units XD1 and XD2 that have the configurationdescribed above, the gap between movers XD11 and XD21 and stators XD12and XD22 can be adjusted easily, without using adjustment plates such asspacers and the like. An adjustment procedure is described below, basedon FIG. 28. Firstly, in the adjustment, the worker fixes movable member84 to base block 62 a using a suitable fixture. Next, the workerattaches a non-magnetic material block 69 which has a thickness largerby a suitable gap amount g than movers XD11 and XD21 to both of the sidesurfaces of movable member 84. Next, the worker fixes fixed member 63 tobase block 62 a using a fixture (bolt) 63 ₀, in a state where statorsXD12 and XD22 fixed to the inner side surface of fixed member 63 are incontact with non-magnetic material block 69. In this case, because thefixed surface (a surface parallel to the XZ plane) is not parallel tothe inner side surface (the surface tilted by an angle of ±θ withrespect to the Z-axis) of fixed member 63, by adjusting the fixedposition (height) by sliding fixed member 63 in the vertical directionshown by an outlined arrow in FIG. 28, the size of the gap can beadjusted. In this case, to make such an adjustment possible, in fixedmember 63, an elongated slot is formed whose XZ section is longer in theZ-axis direction than a circle in which fixture (bolt) 63 ₀ can slidevertically.

Subsequently, the worker similarly fixes all fixed members 63 (exceptfor fixed members 63 closest to the +X edge and the −X edge) to baseblock 62 a, while changing the X position of movable member 84. Finally,after the worker has exchanged non-magnetic material block 69 to moversXD11 and XD21 in a state where movable member 84 is withdrawn to the +Xedge (or −X edge), fixed members 63 on the ±X ends are fixed to baseblock 62 a.

This allows stator XD12 and XD22 to be fixed strongly in a wide range onthe inner side surface of fixed member 63, and also allows the gapformed with movers XD11 and XD21 to be adjusted easily. Further, becausethe processing accuracy in the structure of X-axis drive units XD1 andXD2 becomes low, the arrangement is economical. As a result, it becomespossible to configure substrate stage device PSTe having a high driveaccuracy at a relatively low cost. Further, because stators XD12 andXD22 (magnet units) are fixed to the inner side (the inner side surfaceof fixed member 63) of X-axis drive units XD1 and XD2, the stators arenot drawn even if a magnetic body nears the outer surface of fixedmember 63.

In the exposure apparatus related to the fifth embodiment that isconfigured in the manner described above, although a detaileddescription will be omitted, lot processing is performed in a proceduresimilar to the exposure apparatus 10 related to the first embodimentpreviously described.

As described above, according to the exposure apparatus related to thefifth embodiment, by using a resultant force P of an drawing force Fz1acting between the first mover XD11 and the first stator XD12 equippedin the pair of X-axis drive units XD1 and XD2 that drive substrate stageST (X stage STX) in the X-axis direction, and a perpendicular componentof force Fz2 acting between the second mover XD21 and the second statorXD22 as a levitation force, the load acting on base blocks 62 a and 62 bincluding the self-weight of the substrate stage can be reduced, anddrive control of substrate stage ST (X stage STX) with high precisionbecomes possible, without disturbing the drive performance.

Further, according to the exposure apparatus related to the fifthembodiment, because substrate stage ST (to be more precise, X stage STXwhich holds substrate P via Y stage STY) holding substrate P can bedriven with high precision at the time of scanning exposure of substrateP, exposure with high precision of substrate P becomes possible.

Incidentally, in the fifth embodiment described above, while X-axisdrive unit XD1 (XD2) was configured, using movable member 84 whosesectional plane is an isosceles trapezoidal shape, instead of this, itis possible to configure X-axis drive unit XD1 (XD2), using movablemember 84 that has a sectional plane which is not an isoscelestrapezoidal shape, as in the first and the second modified examplesdescribed below.

FIG. 29 shows a configuration of an X-axis drive unit XD1 (XD2) relatedto a first modified example (however, as for base block 62 a, fixedmember, and movable member 84, the same reference numerals are used asin the fifth embodiment described above for the sake of convenience). Inthe configuration in FIG. 29, the angle of inclination of the ±Y sidesurfaces of movable member 84 differ from each other (θ1>θ2). Therefore,horizontal components of magnetic attractive forces F1 and F2 of linearmotors XDM1 and XDM2 are not canceled, and a resultant force Py in the−Y direction acts on movable member 84.

In the configuration of X-axis drive unit XD1 (XD2) in FIG. 29, a thrusttype static gas bearing devices XG3 a and XG4 are used as the guidedevice. On the inner bottom surface and both of the side surfaces of thegroove in base block 62 a, guide surfaces XGG3 and XGG4 with highflatness are formed (guide surfaces XGG3 and XGG4 each have two guidesurfaces which are the bottom surface orthogonal to the side surface ofthe groove). To the bottom surface of movable member 84, air pads XGP3and XGP4 are attached which are a plurality of static gas bearings thathave bearing surfaces facing guide surfaces XGG3 and XGG4, respectively.Air pad XGP3 and XGP4 blow out high pressure air into a slight gap(bearing gap) between the bearing surfaces and guide surfaces XGG3 andXGG4, via a stop (a compensating element). In this case, air pads XGP3and XGP4 each have two functions of an air pad, which are limiting thepitching movement and yawing movement of movable member 84.

In thrust type static gas bearing devices XG3 a and XG4, by applying anexternal force to movable member 84 by pushing the bearing surface ofair pads XGP3 and XGP4 against guide surfaces XGG3 and XGG4, therigidity of an air film (air pad) within the gap can be increased.Accordingly, by appropriately setting the angle of inclination θ₁ and θ₂of the ±Y side surfaces of movable member 84, adjusting a resultantforce Pz of a vertical direction component and a resultant force Py of ahorizontal direction component of magnetic attractive forces F1 and F2of linear motors XDM1 and XDM2, and adjusting the load in the verticaldirection and the load in the horizontal direction that are applied toair pads XGP3 and XGP4, the rigidity of each air pad can be optionallyadjusted.

Further, by adjusting resultant force Py appropriately setting the angleof inclination θ1 and θ2 of the ±Y side surfaces of movable member 84,and adjusting the load in the horizontal direction that are applied toair pads XGP3 and XGP4, the rigidity of one of the air pads of air padsXGP3 and XGP4 can be made higher than the other air pad. This allowsmovable member 84 to move along one of the guide surfaces. Accordingly,in the case the parallelism of guide surfaces XGG3 and XGG4 formed byboth of the side surfaces of the groove is poor, movable member 84 canbe made to move along the guide surface where the air pad that has highrigidity faces. Further, in the case the straightness of one of theguide surfaces XGG3 and XGG4 formed by both of the side surfaces of thegroove is poor, by increasing the rigidity of the air pad facing theother guide surface of the guide surfaces XGG3 and XGG4, movable member84 can be made to move along the guide surface whose straightness isgood facing the air pad with high rigidity.

FIG. 30 shows a configuration of an X-axis drive unit XD1 (XD2) of asecond modified example (however, as for base block 62 a, fixed member,and movable member 84, the same reference numerals are used as in thefifth embodiment described above for the sake of convenience). In theconfiguration in FIG. 30, while guide surface XGG3 previously describedis formed at the −Y side of the groove on the bottom surface and theside surface, at the +Y side of the groove, a guide surface XGG4 isformed only on the bottom surface. And, air pads XGP3 and XGP4′ thathave bearing surfaces that face these guide surfaces XGG3 and XGG4′,respectively, are attached to the bottom surface of movable member 84.In this case as well, movable member 84 can be moved along guide surfaceXGG3 to which air pad XGP3 faces, as in the first modified exampledescribed above.

Incidentally, because it is difficult in general to form guide surfacesthat have high flatness on both side surfaces of the groove of baseblock 62 a, a guide surface can be provided on both side surfaces of thegroove with base block 62 a being configured using a plurality ofdividing members.

Incidentally, in the fifth embodiment described above, the case has beendescribed where a magnetic attractive force acts between stators (XD11,XD21) and movers (XD12, XD22) in each of the linear motors XDM1 and XDM2equipped in the two X-axis drive units XD1 and XDM2, and the verticaldirection component of the attractive force is in a direction pulling upthe mover from the stator side. However, as well as this, for example, aconfiguration can be employed where the position of the stators (XD11,XD21) and the movers (XD12, XD22) in each of the linear motors XDM1 andXDM2 in the fifth embodiment is switched. In this case, at the time whenX stage STX is driven in the X-axis direction, a magnetic repulsiveforce (repulsion) should act between the stator (XD11, XD21) and themover (XD12, XD22), and the vertical direction component of therepulsive force (repulsion) should be in a direction where mover ispushed up from the stator side. Even in such a case, the resultant forceof the vertical direction component of the force acting in between thestator (XD11, XD21) and the mover (XD12, XD22) can be utilized as alevitation force, and an equal effect as in the fifth embodiment can beobtained. Besides this, in addition to or instead of the magnetic forcebetween the stator (XD11, XD21) and the mover (XD12, XD22), otherattractive forces (e.g., vacuum suction force) or a repulsive force(e.g., static pressure of gas) may at least work at the time when Xstage STX is driven in the X-axis direction. Even in such a case, thevertical direction component of the suction force or the repulsion canbe utilized as a levitation force.

Incidentally, in the fifth embodiment described above, while substrate Pwas mounted on Y stage STY, as in the stage device which is disclosedin, for example, U.S. Patent Application Publication No. 2010/0018950, afine movement stage which is driven in directions of six degrees offreedom with respect to Y stage STY can be provided, and substrate P canbe mounted on the fine movement stage. In this case, a weightcancellation device, as disclosed in U.S. Patent Application PublicationNo. 2010/0018950 described above, can be provided and can support thefine movement stage described above from below.

Incidentally, in the exposure apparatus related to each of theembodiments described above, the illumination light can be ultravioletlight, such as ArF excimer laser light (with a wavelength of 193 nm) andKrF excimer laser light (with a wavelength of 248 nm), or vacuumultraviolet light such as F₂ laser light (with a wavelength of 157 nm).Further, as the illumination light, a harmonic wave, which is obtainedby amplifying a single-wavelength laser light in the infrared or visiblerange emitted by a DFB semiconductor laser or fiber laser with a fiberamplifier doped with, for example, erbium (or both erbium andytterbium), and by converting the wavelength into ultraviolet lightusing a nonlinear optical crystal, can also be used. Further, solidstate laser (with a wavelength of 355 nm, 266 nm) or the like can alsobe used.

Further, while, in each of the embodiments described above, the case hasbeen described where projection optical system PL is the projectionoptical system by a multi-lens method that is equipped with a pluralityof projection optical units, the number of the projection optical unitsis not limited thereto, but there should be one or more projectionoptical units. Further, the projection optical system is not limited tothe projection optical system by a multi-lens method, but can be aprojection optical system using, for example, a large mirror of theOffner type, or the like.

Further, in the exposure apparatus related to each of the embodimentsdescribed above, the projection optical system is not limited to anequal magnifying system, and can also be a reduction system or amagnifying system, and can also be a catadioptric system, a catoptricsystem, or a dioptric system. Further, the projected image maybe eitheran inverted image or an upright image.

Incidentally, in the embodiment described above, alight transmissivetype mask is used, which is obtained by forming a predeterminedlight-shielding pattern (or a phase pattern or a light-attenuationpattern) on a light transmissive mask substrate. Instead of this mask,however, as disclosed in, for example, U.S. Pat. No. 6,778,257, anelectron mask (a variable shaped mask) on which a light-transmittingpattern, a reflection pattern, or an emission pattern is formedaccording to electronic data of the pattern that is to be exposed, forexample, a variable shaped mask that uses a DMD (Digital MicromirrorDevice) that is a type of a non-emission type image display element(which is also called a spatial light modulator) can also be used.

Incidentally, it is particularly effective to apply the exposureapparatus related to each of the embodiments described above to anexposure apparatus which exposes a substrate whose size (including atleast one of the external diameter, diagonal line, and one side) is 500mm or more, such as, for example, a large substrate of a flat paneldisplay (FPD) such as the liquid crystal display and the like.

Further, each of the embodiments described above can also be applied toan exposure apparatus by a step-and-stitch method. Further, especiallythe fifth embodiment described above can be applied, for example, to astatic type exposure apparatus.

Further, the application of the exposure apparatus is riot limited tothe exposure apparatus for liquid crystal display elements in which aliquid crystal display element pattern is transferred onto a rectangularglass plate, but each of the embodiments above can also be widelyapplied, for example, to an exposure apparatus for manufacturingsemiconductors, and an exposure apparatus for producing thin-filmmagnetic heads, micromachines, DNA chips, and the like. Further, thepresent invention can be applied not only to an exposure apparatus forproducing microdevices such as semiconductor devices, but can also beapplied to an exposure apparatus that transfers a circuit pattern onto aglass plate or silicon wafer to produce a mask or a reticle used in alight exposure apparatus, an EUV exposure apparatus, an X-ray exposureapparatus, an electron-beam exposure apparatus, and the like.Incidentally, an object that is subject to exposure is not limited to aglass plate, but for example, can be another object such as a wafer, aceramic substrate, a film member or a mask blank. Further, in the casewhere an exposure subject is a substrate for flat-panel display, thethickness of the substrate is not limited in particular, and forexample, a film like member (a sheet like member having flexibility) isalso included.

Incidentally, the above disclosures of all the publications, the PCTInternational Publications descriptions, and the U.S. Patent ApplicationPublications descriptions, and the U.S. Patents descriptions that arecited in the description above and related to exposure apparatuses andthe like are each incorporated herein by reference.

Device Manufacturing Method

A manufacturing method of a microdevice that uses the exposure apparatusrelated to each of the embodiments above in a lithography process isdescribed next. In the exposure apparatus concerning each embodimentdescribed above, liquid crystal display as the micro device can beobtained by forming a predetermined pattern (a circuit pattern, anelectrode pattern) on a plate (a glass substrate).

Pattern Forming Process

First of all, a so-called optical lithography process in which a patternimage is formed on a photosensitive substrate (such as a glass substratecoated with a resist) is executed using the exposure apparatus relatedto each of the embodiments described above. In this optical lithographyprocess, a predetermined pattern that includes many electrodes and thelike is formed on the photosensitive substrate. After that, the exposedsubstrate undergoes the respective processes such as a developmentprocess, an etching process and a resist removing process, and therebythe predetermined pattern is formed on the substrate.

Color Filter Forming Process

Next, a color filter in which many sets of three dots corresponding to R(ted), G (Green) and B (blue) are disposed in a matrix shape, or a colorfilter in which a plurality of sets of filters of three stripes of R, Gand B are disposed in horizontal scanning line directions is formed.

Cell Assembling Process

Next, a liquid crystal panel (a liquid crystal cell) is assembled usingthe substrate having the predetermined pattern obtained in the patternforming process, the color filter obtained in the color filter formingprocess, and the like. For example, a liquid crystal panel (a liquidcrystal cell) is manufacture by injecting liquid crystal between thesubstrate having the predetermined pattern obtained in the patternforming process and the color filter obtained in the color filterforming process.

Module Assembling Process

After that, a liquid crystal display element is completed by attachingrespective components such as an electric circuit that causes a displayoperation of the assembled liquid crystal panel (liquid crystal cell) tobe performed, and a backlight. In this case, since exposure of thesubstrate is performed with high throughput and high precision using theexposure apparatus related to each of the embodiments described above inthe pattern forming process, the productivity of liquid crystal displayelements can be improved as a consequence.

While the above-described embodiments of the present invention are thepresently preferred embodiments thereof, those skilled in the art oflithography systems will readily recognize that numerous additions,modifications, and substitutions maybe made to the above-describedembodiments without departing from the spirit and scope thereof. It isintended that all such modifications, additions, and substitutions fallwithin the scope of the present invention, which is best defined by theclaims appended below.

What is claimed:
 1. An exposure apparatus of a scanning type which movesan object subject to exposure in a first direction parallel to ahorizontal plane with a predetermined first stroke with respect to anenergy beam for exposure at the time of exposure processing, theapparatus comprising: a first movable body which is movable by thepredetermined first stroke at least in the first direction; a secondmovable body which guides movement of the first movable body in thefirst direction and is movable by a second stroke along with the firstmovable body in a second direction orthogonal to the first directionwithin the horizontal plane; an object holding member which holds theobject and is movable in a direction at least parallel to the horizontalplane with the first movable body; a weight cancellation device whichsupports the object holding member from below and cancels weight of theobject holding member; and a support member which extends in the firstdirection, and supports the weight cancellation device from below, andalso is movable in the second direction by the second stroke in a statesupporting the weight cancellation device from below.
 2. The exposureapparatus according to claim 1, wherein the second movable body isdriven in the second direction by a first linear motor including astator provided in a predetermined fixed member, and a mover provided inthe second movable body, and the support member is driven in the seconddirection by a second linear motor including the stator and a moverprovided in the support member.
 3. The exposure apparatus according toclaim 2, wherein the support member is vibrationally separated withrespect to the stator.
 4. The exposure apparatus according to any claim1, wherein the support member is mechanically connected to the secondmovable body by a connecting device, and moves in the second directionby being pulled by the second movable body via the connecting devicewhen the second movable body moves.
 5. The exposure apparatus accordingto claim 4, wherein when compared to rigidity in the second direction,rigidity of the connecting device is lower in other directions.
 6. Theexposure apparatus according to claim 4, wherein the connecting deviceis connected to the support member on an axis that passes through thecenter of gravity of the support member and is parallel to the seconddirection.
 7. The exposure apparatus according to claim 1, wherein thesupport member is provided in the second movable body, and moves in thesecond direction by being pushed by a plurality of pushing devices thatcome into point contact with the support member.
 8. The exposureapparatus according to claim 7, wherein the plurality of pushing devicesseparate from the support member when the movable body moves in thefirst direction in predetermined strokes.
 9. The exposure apparatusaccording to claim 1, the apparatus further comprising: a static gasbearing which blows out gas from one of the support member and thesecond movable body to the other, wherein the support member moves inthe second direction by being pushed in a non-contact manner by thesecond movable body via the gas when the second movable body moves inthe second direction.
 10. The exposure apparatus according to claim 1,wherein the support member has a first magnet, the second movable bodyhas a second magnet which is provided opposing the first magnet in thesecond direction, and whose magnetic pole of a part opposing each otheris the same as the first magnet, and the support member moves in thesecond direction by being pushed by the second movable body in anon-contact state by a repulsive force generated between the first andsecond magnets when the second movable body moves in the seconddirection.
 11. The exposure apparatus according to claim 1, theapparatus further comprising: a guide member which includes an elementof a single axis guide device that mechanically guides the movement ofthe support member in the second direction, and the guide member isvibrationally separated with respect to the first and second movablebodies.
 12. The exposure apparatus according to claim 11, wherein aplurality of the single axis guide devices are provided at apredetermined distance in the second direction.
 13. The exposureapparatus according to claim 11, wherein a plurality of the guidemembers are provided spaced apart from each other along the seconddirection, and the support member is mounted stretching over theplurality of guide members.
 14. The exposure apparatus according toclaim 13, wherein an intermediate support member supporting the secondmovable body from below is placed in between the plurality of guidemembers.
 15. The exposure apparatus according to claim 11, wherein theguide member includes a main section consisting of a hollow member, anda stiffening member provided inside the main section to improve rigidityof the main section in a vertical direction.
 16. The exposure apparatusaccording to claim 1, wherein the support member consists of a memberhaving a rib structure that has the weight cancellation device mountedon its upper surface and a plurality of stiffening ribs on the lowersurface.
 17. The exposure apparatus according to claim 1, wherein thesupport member consists of a solid stone material.
 18. The exposureapparatus according to claim 1, wherein the weight cancellation deviceis mounted on the support member in a non-contact state.
 19. Theexposure apparatus according to claim 1, wherein the object holdingmember is finely movable with respect to the first movable body in atleast the first direction, the second direction, and a direction aroundthe axis orthogonal to the horizontal plane.
 20. The exposure apparatusaccording to claim 19, wherein the object holding member is finelymovable with respect to the first movable body further in a directionorthogonal to the horizontal plane, and a direction around the axisparallel to the horizontal plane.
 21. The exposure apparatus accordingto claim 1, wherein the first movable body is driven in the firstdirection in the first stroke by a linear motor including a statorprovided in the second movable body, and a mover provided in the firstmovable body.
 22. The exposure apparatus according to claim 1, whereinan oscillating support device that oscillatably supports the objectholding member around the axis parallel to the horizontal plane.
 23. Theexposure apparatus according to claim 22, wherein the oscillatingsupport device supports the object holding member in a non-contactmanner.
 24. The exposure apparatus according to claim 22, wherein theoscillating support device is supported from below by the weightcancellation device, and the weight cancellation device is mounted onthe support member in a non-contact state.
 25. The exposure apparatusaccording to claim 22, wherein the oscillating support device is movablein a direction parallel to the horizontal plane integrally with theobject holding member, and the weight cancellation device ismechanically connected with the oscillating support device, and moves ina direction parallel to the horizontal plane integrally with the objectholding member and the oscillating support device.
 26. The exposureapparatus according to claim 22, wherein the oscillating support deviceis mounted on the support member in a non-contact state, and the weightcancellation device is supported from below by the oscillating supportdevice.
 27. The exposure apparatus according to claim 26, wherein theweight cancellation device is equipped with a force generation devicewhich generates a force upward in a vertical direction, and the forcegeneration device is supported from below by the oscillating supportdevice, and is placed above an oscillating member which oscillatesaround an axis parallel to the horizontal plane integrally with theobject holding member.
 28. The exposure apparatus according to claim 22,wherein the weight cancellation device is equipped with a forcegeneration device which generates a force upward in a verticaldirection, and the oscillating support device is placed movable in adirection orthogonal to the horizontal plane, and transmits the forcegenerated by the force generation device to the object holding member.29. The exposure apparatus according to claim 1, wherein at least a partof a position of the second movable body in a direction orthogonal tothe horizontal plane and a position of the support member in thedirection orthogonal to the horizontal plane overlap each other.
 30. Theexposure apparatus according to claim 1, wherein the object is asubstrate used to manufacture a flat panel display.
 31. A flat-paneldisplay manufacturing method, comprising: exposing a substrate using theexposure apparatus according to claim 30; and developing the substratethat has been exposed.
 32. A device manufacturing method, comprising:exposing an object using the exposure apparatus according to claim 1;and developing the object that has been exposed.